Lithography: Perovskite Nanoparticle Composite Films by Size Exclusion Lithography (Adv. Mater. 39/2018)
Source abstract
Abstract
In article number 1802555, Youngjong Kang and co-workers report the fabrication of FAPbX3–polymer composite films by utilizing size-exclusive diffusion of perovskite nanoparticles in photopolymerizing films. Size-exclusion lithography (SEL) enables high-resolution patterns of perovskite nanoparticles to be created over a large area during the formation of the polymer films by photopolymerization. The perovskite nanoparticles are excluded by the small mesh size of the polymer networks.
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Research context
OpenAlex topics: Synthesis and properties of polymers · Nanofabrication and Lithography Techniques
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Affiliations
Department of Chemistry Hanyang University 222 Wangsimni‐Ro Seongdong‐Gu Seoul 04763 Korea
Department of Physics HYU‐HPSTAR‐CIS High Pressure Research Center Hanyang University Seoul 04763 South Korea
Department of Chemistry Research Institute for Natural Sciences Institute of Nano Science and Technology Hanyang University 222 Wangsimni‐Ro Seongdong‐Gu Seoul 04763 Korea
References
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