Polyelectrolyte Negative Resist Patterns as Templates for the Electrostatic Assembly of Nanoparticles and Electroless Deposition of Metallic Films

Electron-beam lithography is used to pattern either cationic polyvinyl N-methyl pyridine or anionic sulfonated polystyrene polymers, that act as negative resists, to produce templates for electroless deposition and the electrostatic assembly of metallic, magnetic, or semiconductor nanoparticles. Supporting information for this article is available on the WWW under http://www.wiley-vch.de/contents/jc_2089/2008/adma200703095_s.pdf or from the author. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.