journal article·2006-04-18

Employing Thin‐Film Delamination for the Formation of Shadow Masks for Nanostructure Fabrication

M. Elbahri, S. K. Rudra, S. Wille, S. Jebril, M. Scharnberg, D. Paretkar, R. Kunz, H. Rui, A. Biswas, R. Adelung

Advanced Materials· Volume 18· Issue 8
Publisher page

Abstract

Based on controlled thin-film fracture and delamination, a simple method to obtain well-aligned nanowires and nanochannels on different substrates is presented. The method is used to create templates in the form of nanoshadow masks. This allows the formation of complex nanowire structures on a variety of substrate materials, such as metals, semiconductors, and polymers. The figure shows parallel Au nanowires on Si fabricated by this approach.
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Research context

OpenAlex topics: Nanofabrication and Lithography Techniques · Fluid Dynamics and Thin Films · Anodic Oxide Films and Nanostructures

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (10)

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