journal article·2016-12Open access

Single Electron Gating of Topological Insulators

Paolo Sessi, Thomas Bathon, Konstantin Aleksandrovich Kokh, Oleg Evgenievich Tereshchenko, Matthias Bode

Advanced Materials· Volume 28· Issue 45

Abstract

The effective gating of topological insulators is demonstrated, through the coupling of molecules to their surface. By using electric fields, they allow for dynamic control of the interface charge state by adding or removing single electrons. This process creates a robust transconductance bistability resembling a single-electron transistor. These findings make hybrid molecule/topological interfaces functional elements while at the same time pushing miniaturization to its ultimate limit. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
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Research context

OpenAlex topics: Topological Materials and Phenomena · Quantum and electron transport phenomena · Electronic and Structural Properties of Oxides

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Physikalisches Institut Experimentelle Physik II Universität Würzburg Am Hubland 97074 Würzburg Germany

V.S. Sobolev Institute of Geology and Mineralogy Siberian Branch Russian Academy of Sciences 630090 Novosibirsk Russia

Physics Department Novosibirsk State University 630090 Novosibirsk Russia

Saint‐Petersburg State University 198504 Saint‐Petersburg Russia

A.V. Rzanov Institute of Semiconductor Physics Siberian Branch Russian Academy of Sciences 630090 Novosibirsk Russia

Wilhelm Conrad Röntgen‐Center for Complex Material Systems (RCCM) Am Hubland 97074 Würzburg Germany

Funding

Deutsche Forschungsgemeinschaft · Russian Foundation for Basic Research

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