Self‐Rectifying Memristors Based on Dimensionally Graded Halide Perovskites
Source abstract
Abstract
ABSTRACT Neuromorphic in‐memory computing has emerged as one of the forerunners in addressing the data deluge problem in this age of smart electronics and artificial intelligence. Memristor crossbar arrays are fundamental storage and processing hardware frameworks that enable in‐memory computing. Halide perovskites have been examined for memristors, owing to their mixed ionic‐electronic conduction and solution processability. However, such studies so far have not addressed the challenge of sneak paths, which can result in erroneous computation. Self‐rectifying memristors, which can be integrated into a passive crossbar array, are the most efficient solution to the sneak‐path problem in terms of circuit complexity and device footprint. This work introduces a new approach to realizing a self‐rectifying halide memristor by creating a 2D to 3D dimensionally graded perovskite. Through a careful selection of 2D spacer cations based on the energy level alignment with methylammonium lead iodide, a favorable heterojunction is created that achieves a rectification ratio > 10 3 . Moreover, the memristor displayed robust synaptic characterization (endurance > 4 × 10 4 pulses) with high linearity in weight update. By suppressing the sneak currents, a far larger 140 × 140 crossbar array could be supported. Using this, 93% accuracy is achieved in an image classification task despite introducing write noise.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Neural Networks and Reservoir Computing
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of Materials Science and Engineering Nanyang Technological University 50 Nanyang Avenue Singapore Singapore
Department of Electrical Engineering City University of Hong Kong Kowloon Hong Kong SAR Hong Kong
Energy Research Institute @ NTU (ERI@N) Nanyang Technological University 50 Nanyang Drive Singapore Singapore
Funding
National Research Foundation Singapore
References (39)
Show source-provided references
1. G.Kestor R.Gioiosa D. J.Kerbyson andA.Hoisie 2013 IEEE International Symposium on Workload Characterization (IISWC) (IEEE 2013) 56–65.10.1109/IISWC.2013.6704670 ↗
2. 10.1007/978-3-319-33742-5_310.1007/978-3-319-33742-5_3 ↗
3. H.Amrouch N.Du A.Gebregiorgis S.Hamdioui andI.Polian 2021 IFIP/IEEE 29th International Conference on Very Large Scale Integration (VLSI‐SoC) (IEEE 2021) 1–6.10.1109/VLSI-SoC53125.2021.9606966 ↗
4. 10.1038/s41928‐023‐01082‐z10.1038/s41928‐023‐01082‐z ↗
5. 10.1021/acs.jpclett.2c0130310.1021/acs.jpclett.2c01303 ↗
6. 10.1021/acsenergylett.2c0166310.1021/acsenergylett.2c01663 ↗
7. 10.1038/ncomms849710.1038/ncomms8497 ↗
8. 10.1063/1.514381510.1063/1.5143815 ↗
9. 10.1038/s41578‐019‐0159‐310.1038/s41578‐019‐0159‐3 ↗
10. 10.1002/adma.20170591410.1002/adma.201705914 ↗
11. 10.1016/j.mejo.2012.10.00110.1016/j.mejo.2012.10.001 ↗
12. Y.Cassuto S.Kvatinsky andE.Yaakobi 2013 IEEE International Symposium on Information Theory (IEEE 2013) 156–160.10.1109/ISIT.2013.6620207 ↗
13. 10.1002/adma.20230721810.1002/adma.202307218 ↗
14. 10.1021/acsnano.4c0786910.1021/acsnano.4c07869 ↗
15. 10.1039/D0NA00100G10.1039/D0NA00100G ↗
16. 10.1002/admt.20240058510.1002/admt.202400585 ↗
17. 10.1109/LED.2014.231470410.1109/LED.2014.2314704 ↗
18. 10.1002/adfm.20120217010.1002/adfm.201202170 ↗
19. 10.1002/adfm.20230797110.1002/adfm.202307971 ↗
20. 10.1016/j.nanoen.2025.11087110.1016/j.nanoen.2025.110871 ↗
21. 10.1063/5.024820310.1063/5.0248203 ↗
22. 10.1016/j.mtener.2024.10169210.1016/j.mtener.2024.101692 ↗
23. 10.1021/acsenergylett.1c0214810.1021/acsenergylett.1c02148 ↗
24. 10.1038/nnano.2016.11010.1038/nnano.2016.110 ↗
25. 10.1002/adfm.20190088110.1002/adfm.201900881 ↗
26. 10.1021/acsami.4c1139410.1021/acsami.4c11394 ↗
27. 10.1021/acs.chemmater.9b0256010.1021/acs.chemmater.9b02560 ↗
28. 10.1002/adfm.20170692310.1002/adfm.201706923 ↗
29. 10.1038/s41467‐021‐23616‐910.1038/s41467‐021‐23616‐9 ↗
30. 10.1016/j.chempr.2021.12.02210.1016/j.chempr.2021.12.022 ↗
31. 10.1109/TCAD.2018.278972310.1109/TCAD.2018.2789723 ↗
32. 10.1021/acs.jpclett.4c0217010.1021/acs.jpclett.4c02170 ↗
33. 10.1002/adma.20200785110.1002/adma.202007851 ↗
34. 10.1016/j.joule.2024.02.02210.1016/j.joule.2024.02.022 ↗
35. 10.1002/adfm.20231598210.1002/adfm.202315982 ↗
36. 10.1002/adfm.20200541310.1002/adfm.202005413 ↗
37. 10.1021/acs.jpclett.1c0180310.1021/acs.jpclett.1c01803 ↗
38. 10.1109/TNANO.2024.341538210.1109/TNANO.2024.3415382 ↗
39. J.Li H.Xu J.Xing et al. 2016 IEEE Advanced Information Management Communicates Electronic and Automation Control Conference (IMCEC) (IEEE 2016) 830–834.