journal article·2024-11Open access

Indirect‐To‐Direct Bandgap Crossover and Room‐Temperature Valley Polarization of Multilayer MoS2 Achieved by Electrochemical Intercalation

Min‐kyung Jo, Eunji Lee, Eoram Moon, Bo Gyu Jang, Jeongtae Kim, Krishna Prasad Dhakal, Saeyoung Oh, Seong Rae Cho, Nurul Hasanah, Seungmo Yang, Hu Young Jeong, Jeongyong Kim, Kibum Kang, Seungwoo Song

Advanced Materials· Volume 36· Issue 47

Abstract

Abstract Monolayer (1L) group VI transition metal dichalcogenides (TMDs) exhibit broken inversion symmetry and strong spin‐orbit coupling, offering promising applications in optoelectronics and valleytronics. Despite their direct bandgap, high absorption coefficient, and spin‐valley locking in K or K’ valleys, the ultra‐short valley lifetime limits their room‐temperature applications. In contrast, multilayer TMDs, with more absorptive layers, sacrifice the direct bandgap and valley polarization upon gaining inversion symmetry from the bilayer structure. Here, we demonstrate that multilayer molybdenum disulfide (MoS2) can maintain 1) a structure with broken inversion symmetry and strong spin‐orbit coupling, 2) a direct bandgap with high photoluminescence (PL) intensity, and 3) stable valley polarization up to room temperature. Through the intercalation of organic 1‐ethyl‐3‐methylimidazolium (EMIM+) ions, multilayer MoS2 not only exhibits layer decoupling but also benefits from an electron doping effect. This results in a hundredfold increase in PL intensity and stable valley polarization, achieving 55% and 16% degrees of valley polarization at 3 K and room temperature, respectively. The persistent valley polarization at room temperature, due to interlayer decoupling and trion dominance facilitated by a gate‐free method, opens up potential applications in valley‐selective optoelectronics and valley transistors.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · Perovskite Materials and Applications · Graphene research and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Samsung Electronics Hwaseong 18448 South Korea

Department of Materials Science and Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon 34141 South Korea

Strategic Technology Research Institute Korea Research Institute of Standards and Science (KRISS) Daejeon 34113 South Korea

Department of Energy Science Sungkyunkwan University Suwon 16419 South Korea

Department of Advanced Materials Engineering for Information & Electronics Kyung Hee University Yongin Gyeonggi 17104 South Korea

Department of Mechanical Engineering University of Hong Kong Pokfulam Road Hong Kong China

Quantum Technology Institute Korea Research Institute of Standards and Science (KRISS) Daejeon 34113 Republic of South Korea

UNIST Central Research Facilities (UCRF) and Department of Materials Science and Engineering Ulsan National Institute of Science and Technology (UNIST) Ulsan 44919 South Korea

Funding

Korea Research Institute of Standards and Science · Ministry of Science and ICT, South Korea

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