Source abstract
Abstract
Abstract Contact engineering for monolayered transition metal dichalcogenides (TMDCs) is considered to be of fundamental challenge for realizing high‐performance TMDCs‐based (opto) electronic devices. Here, an innovative concept is established for a device configuration with metallic copper monosulfide (CuS) electrodes that induces sulfur vacancy healing in the monolayer molybdenum disulfide (MoS2) channel. Excess sulfur adatoms from the metallic CuS electrodes are donated to heal sulfur vacancy defects in MoS2 that surprisingly improve the overall performance of its devices. The electrode‐induced self‐healing mechanism is demonstrated and analyzed systematically using various spectroscopic analyses, density functional theory (DFT) calculations, and electrical measurements. Without any passivation layers, the self‐healed MoS2 (photo)transistor with the CuS contact electrodes show outstanding room temperature field effect mobility of 97.6 cm2 (Vs)−1, On/Off ratio > 108, low subthreshold swing of 120 mV per decade, high photoresponsivity of 1 × 104 A W−1, and detectivity of 1013 jones, which are the best among back‐gated transistors that employ 1L MoS2. Using ultrathin and flexible 2D CuS and MoS2, mechanically flexible photosensor is also demonstrated, which shows excellent durability under mechanical strain. These findings demonstrate a promising strategy in TMDCs or other 2D material for the development of high performance and functional devices including self‐healable sulfide electrodes.
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Research context
OpenAlex topics: 2D Materials and Applications · Advanced Sensor and Energy Harvesting Materials · Perovskite Materials and Applications
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Affiliations
Department of Physics Sungkyunkwan University (SKKU) Suwon Gyeonggi‐do 16419 Republic of Korea
Chemical Data‐Driven Research Center Korea Research Institute of Chemical Technology (KRICT) Gajeong‐ro 141 Daejeon 34114 Republic of Korea
Nanodevices Laboratory Korea Advanced Nano Fab Center (KANC) Suwon 16229 Republic of Korea
University of Michigan ‐ Shanghai Jiao Tong University Joint Institute Shanghai Jiao Tong University Minhang District Shanghai 200240 P. R. China
Department of Electrical Engineering Semyung University Chungcheongbuk‐do 27136 Republic of Korea
School of Materials Science and Engineering Kookmin University Seoul 02707 Republic of Korea
Funding
Korea Research Institute of Chemical Technology
References (50)
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