journal article·2023-04Open access

Substitutional p‐Type Doping in NbS 2 –MoS 2 Lateral Heterostructures Grown by MOCVD

Zhenyu Wang, Mukesh Tripathi, Zahra Golsanamlou, Poonam Kumari, Giuseppe Lovarelli, Fabrizio Mazziotti, Demetrio Logoteta, Gianluca Fiori, Luca Sementa, Guilherme Migliato Marega, Hyun Goo Ji, Yanfei Zhao, Aleksandra Radenovic, Giuseppe Iannaccone, Alessandro Fortunelli, Andras Kis

Advanced Materials· Volume 35· Issue 14

Abstract

Abstract Monolayer MoS 2 has attracted significant attention owing to its excellent performance as an n‐type semiconductor from the transition metal dichalcogenide (TMDC) family. It is however strongly desired to develop controllable synthesis methods for 2D p‐type MoS 2 , which is crucial for complementary logic applications but remains difficult. In this work, high‐quality NbS 2 –MoS 2 lateral heterostructures are synthesized by one‐step metal–organic chemical vapor deposition (MOCVD) together with monolayer MoS 2 substitutionally doped by Nb, resulting in a p‐type doped behavior. The heterojunction shows a p‐type transfer characteristic with a high on/off current ratio of ≈10 4 , exceeding previously reported values. The band structure through the NbS 2 –MoS 2 heterojunction is investigated by density functional theory (DFT) and quantum transport simulations. This work provides a scalable approach to synthesize substitutionally doped TMDC materials and provides an insight into the interface between 2D metals and semiconductors in lateral heterostructures, which is imperative for the development of next‐generation nanoelectronics and highly integrated devices.
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Research context

OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Chalcogenide Semiconductor Thin Films

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Electrical Engineering Institute École Polytechnique Fédérale de Lausanne (EPFL) Lausanne CH‐1015 Switzerland

Institute of Materials Science and Engineering École Polytechnique Fédérale de Lausanne (EPFL) Lausanne CH‐1015 Switzerland

CNR‐ICCOM and IPCF Consiglio Nazionale delle Ricerche via G. Moruzzi 1 Pisa I‐56124 Italy

Department of Information Engineering Università di Pisa Pisa I‐56122 Italy

Department of Physics “E. Fermi” Università di Pisa Pisa I‐56127 Italy

Institute of Bioengineering École Polytechnique Fédérale de Lausanne (EPFL) Lausanne CH‐1015 Switzerland

Funding

European Research Council · Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung

References (47)

Show source-provided references
1. 10.1038/nnano.2010.27910.1038/nnano.2010.279 ↗
2. 10.1103/PhysRevB.84.04540910.1103/PhysRevB.84.045409 ↗
3. 10.1038/natrevmats.2017.3310.1038/natrevmats.2017.33 ↗
4. 10.1021/nl903868w10.1021/nl903868w ↗
5. 10.1103/PhysRevLett.105.13680510.1103/PhysRevLett.105.136805 ↗
6. 10.1103/PhysRevB.87.16540210.1103/PhysRevB.87.165402 ↗
7. 10.1088/0957-4484/27/18/18570110.1088/0957-4484/27/18/185701 ↗
8. 10.1038/s41586-020-2861-010.1038/s41586-020-2861-0 ↗
9. 10.1038/s41586-020-1942-410.1038/s41586-020-1942-4 ↗
10. 10.1038/s41598-017-04055-310.1038/s41598-017-04055-3 ↗
11. 10.1038/s41565-018-0082-610.1038/s41565-018-0082-6 ↗
12. 10.1021/nl404350510.1021/nl4043505 ↗
13. 10.1088/2053-1583/aafe2d10.1088/2053-1583/aafe2d ↗
14. 10.1021/acs.nanolett.6b0185310.1021/acs.nanolett.6b01853 ↗
15. 10.1021/acsnano.5b0652910.1021/acsnano.5b06529 ↗
16. 10.1021/acsami.7b1586310.1021/acsami.7b15863 ↗
17. 10.1063/1.510015410.1063/1.5100154 ↗
18. 10.1021/acsami.9b1986410.1021/acsami.9b19864 ↗
19. 10.1039/C6NR09495C10.1039/C6NR09495C ↗
20. 10.1021/acsaelm.1c0012110.1021/acsaelm.1c00121 ↗
21. 10.1103/PhysRevB.87.10040110.1103/PhysRevB.87.100401 ↗
22. 10.1103/PhysRevB.87.19520110.1103/PhysRevB.87.195201 ↗
23. 10.1126/sciadv.160006910.1126/sciadv.1600069 ↗
24. 10.1002/adma.20180158610.1002/adma.201801586 ↗
25. 10.1038/nature1238510.1038/nature12385 ↗
26. 10.1016/S0079-6425(01)00009-310.1016/S0079-6425(01)00009-3 ↗
27. 10.1038/nmat409110.1038/nmat4091 ↗
28. 10.1038/nnano.2014.22210.1038/nnano.2014.222 ↗
29. 10.1002/adma.20180366510.1002/adma.201803665 ↗
30. 10.1021/acs.nanolett.7b0231110.1021/acs.nanolett.7b02311 ↗
31. 10.1021/acsnano.1c0795610.1021/acsnano.1c07956 ↗
32. 10.1002/adma.20150084610.1002/adma.201500846 ↗
33. 10.1002/adma.20210328610.1002/adma.202103286 ↗
34. 10.1103/PhysRevB.99.19540110.1103/PhysRevB.99.195401 ↗
35. 10.1063/1.494835710.1063/1.4948357 ↗
36. 10.1021/nl403036h10.1021/nl403036h ↗
37. 10.1038/nmat350510.1038/nmat3505 ↗
38. 10.1103/PhysRevB.66.01251110.1103/PhysRevB.66.012511 ↗
39. 10.1038/s41598-017-05069-710.1038/s41598-017-05069-7 ↗
40. 10.1103/PhysRevB.89.11520110.1103/PhysRevB.89.115201 ↗
41. 10.1021/acs.jpcc.5b0295010.1021/acs.jpcc.5b02950 ↗
42. 10.1063/1.9735910.1063/1.97359 ↗
43. 10.1016/j.microrel.2009.06.00310.1016/j.microrel.2009.06.003 ↗
44. 10.1038/s41467-018-03388-510.1038/s41467-018-03388-5 ↗
45. 10.1088/0953-8984/21/39/39550210.1088/0953-8984/21/39/395502 ↗
46. 10.1103/PhysRevLett.77.386510.1103/PhysRevLett.77.3865 ↗
47. 10.1109/JPROC.2013.225945110.1109/JPROC.2013.2259451 ↗