journal article·2019-06

Gate‐Tunable Graphene–WSe2 Heterojunctions at the Schottky–Mott Limit

Samuel W. LaGasse, Prathamesh Dhakras, Kenji Watanabe, Takashi Taniguchi, Ji Ung Lee

Advanced Materials· Volume 31· Issue 24
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Abstract

Abstract Metal–semiconductor interfaces, known as Schottky junctions, have long been hindered by defects and impurities. Such imperfections dominate the electrical characteristics of the junction by pinning the metal Fermi energy. Here, a graphene–WSe2 p‐type Schottky junction, which exhibits a lack of Fermi level pinning, is studied. The Schottky junction displays near‐ideal diode characteristics with large gate tunability and small leakage currents. Using a gate electrostatically coupled to the WSe2 channel to tune the Schottky barrier height, the Schottky–Mott limit is probed in a single device. As a special manifestation of the tunable Schottky barrier, a diode with a dynamically controlled ideality factor is demonstrated.
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Research context

OpenAlex topics: Graphene research and applications · 2D Materials and Applications · Advanced Memory and Neural Computing

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Affiliations

Colleges of Nanoscale Science and Engineering State University of New York Polytechnic Institute Albany NY 12203 USA

National Institute for Materials Science 1‐1 Namiki Tsukuba 305‐0044 Japan

Funding

U.S. Naval Research Laboratory · National Science Foundation

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