journal article·2022-04

Patterning of Wafer‐Scale MXene Films for High‐Performance Image Sensor Arrays

Bo Li, Qian‐Bing Zhu, Cong Cui, Chi Liu, Zuo‐Hua Wang, Shun Feng, Yun Sun, Hong‐Lei Zhu, Xin Su, Yi‐Ming Zhao, Hong‐Wang Zhang, Jian Yao, Song Qiu, Qing‐Wen Li, Xiao‐Mu Wang, Xiao‐Hui Wang, Hui‐Ming Cheng, Dong‐Ming Sun

Advanced Materials· Volume 34· Issue 17
Publisher page

Abstract

Abstract As a rapidly growing family of 2D transition metal carbides and nitrides, MXenes are recognized as promising materials for the development of future electronics and optoelectronics. So far, the reported patterning methods for MXene films lack efficiency, resolution, and compatibility, resulting in limited device integration and performance. Here, a high‐performance MXene image sensor array fabricated by a wafer‐scale combination patterning method of an MXene film is reported. This method combines MXene centrifugation, spin‐coating, photolithography, and dry‐etching and is highly compatible with mainstream semiconductor processing, with a resolution up to 2 µm, which is at least 100 times higher than other large‐area patterning methods reported previously. As a result, a high‐density integrated array of 1024‐pixel Ti3C2Tx/Si photodetectors with a detectivity of 7.73 × 1014 Jones and a light–dark current ratio (Ilight/Idark) of 6.22 × 106, which is the ultrahigh value among all reported MXene‐based photodetectors, is fabricated. This patterning technique paves a way for large‐scale high‐performance MXetronics compatible with mainstream semiconductor processes.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: MXene and MAX Phase Materials · 2D Materials and Applications · Advanced Memory and Neural Computing

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Shenyang National Laboratory for Materials Science Institute of Metal Research Chinese Academy of Sciences 72 Wenhua Road Shenyang 110016 China

School of Material Science and Engineering University of Science and Technology of China 96 Jinzhai Road Hefei 230026 China

National Engineering Research Center for Equipment and Technology of Cold Strip Rolling College of Mechanical Engineering Yanshan University Qinhuangdao 066004 China

School of Physical Science and Technology ShanghaiTech University 393 Huaxiazhong Road Shanghai 200031 China

National Laboratory of Solid State Microstructures School of Physics School of Electronic Science and Engineering Collaborative Innovation Centre of Advanced Microstructures Nanjing University Nanjing 210008 China

Suzhou Institute of Nano‐Tech and Nano‐Bionics Chinese Academy of Sciences 398 Ruoshui Road Suzhou 215123 China

Institute of Technology for Carbon Neutrality Shenzhen Institute of Advanced Technology Chinese Academy of Sciences 1068 Xueyuan Avenue Shenzhen 518055 China

Funding

Liaoning Revitalization Talents Program · National Natural Science Foundation of China · Chinese Academy of Sciences

References (50)

Show source-provided references
1. 10.1002/adma.20110230610.1002/adma.201102306 ↗
2. 10.1126/science.aba797710.1126/science.aba7977 ↗
3. Sarycheva A. · Science · 2018 · 4
4. 10.1038/s41467-020-16671-110.1038/s41467-020-16671-1 ↗
5. 10.1002/aenm.20190018010.1002/aenm.201900180 ↗
6. 10.1038/s41467-020-15092-410.1038/s41467-020-15092-4 ↗
7. 10.1002/adfm.20200399810.1002/adfm.202003998 ↗
8. 10.1038/s41467-017-01136-910.1038/s41467-017-01136-9 ↗
9. 10.1021/acsnano.9b0345410.1021/acsnano.9b03454 ↗
10. 10.1002/advs.20200220910.1002/advs.202002209 ↗
11. 10.1002/adma.20170665610.1002/adma.201706656 ↗
12. 10.1021/acsnano.6b0841510.1021/acsnano.6b08415 ↗
13. 10.1021/jacs.6b1083410.1021/jacs.6b10834 ↗
14. 10.1002/adma.20190763310.1002/adma.201907633 ↗
15. 10.1021/acs.chemmater.6b0483010.1021/acs.chemmater.6b04830 ↗
16. 10.1021/acs.nanolett.7b0072210.1021/acs.nanolett.7b00722 ↗
17. 10.1038/ncomms797210.1038/ncomms7972 ↗
18. 10.1021/acsphotonics.7b0143910.1021/acsphotonics.7b01439 ↗
19. 10.1002/admt.20180025610.1002/admt.201800256 ↗
20. 10.1039/c3ee43526a10.1039/c3ee43526a ↗
21. 10.1039/C6EE01717G10.1039/C6EE01717G ↗
22. 10.1002/aenm.20160137210.1002/aenm.201601372 ↗
23. 10.1039/C8TA04737E10.1039/C8TA04737E ↗
24. 10.1002/adma.20150465710.1002/adma.201504657 ↗
25. 10.1002/adfm.20180197210.1002/adfm.201801972 ↗
26. 10.1002/adma.20190848610.1002/adma.201908486 ↗
27. 10.1039/C7TA04735E10.1039/C7TA04735E ↗
28. 10.1002/admi.20200042410.1002/admi.202000424 ↗
29. 10.1002/adma.20210737010.1002/adma.202107370 ↗
30. 10.1007/s12274-020-2757-110.1007/s12274-020-2757-1 ↗
31. 10.1002/smll.20150233610.1002/smll.201502336 ↗
32. 10.1002/aelm.20170016510.1002/aelm.201700165 ↗
33. 10.1002/adma.20180765810.1002/adma.201807658 ↗
34. 10.1021/acsnano.9b0194110.1021/acsnano.9b01941 ↗
35. 10.1002/adom.20180152110.1002/adom.201801521 ↗
36. 10.1039/D0MH00537A10.1039/D0MH00537A ↗
37. 10.1021/acs.jpcc.0c0103210.1021/acs.jpcc.0c01032 ↗
38. 10.1002/smll.20210043910.1002/smll.202100439 ↗
39. 10.1002/adma.20190327110.1002/adma.201903271 ↗
40. 10.1016/j.apsusc.2020.14581310.1016/j.apsusc.2020.145813 ↗
41. 10.1039/D0MH00394H10.1039/D0MH00394H ↗
42. 10.1088/1361-6463/abae3610.1088/1361-6463/abae36 ↗
43. 10.1002/aelm.20200095510.1002/aelm.202000955 ↗
44. 10.1002/adma.20210105910.1002/adma.202101059 ↗
45. 10.1038/s41467-021-24397-x10.1038/s41467-021-24397-x ↗
46. 10.1039/C6CS00896H10.1039/C6CS00896H ↗
47. 10.1109/LED.2016.264594610.1109/LED.2016.2645946 ↗
48. 10.1109/LED.2014.236417110.1109/LED.2014.2364171 ↗
49. 10.1039/b108685e10.1039/b108685e ↗
50. 10.1038/s41467-019-12814-110.1038/s41467-019-12814-1 ↗