Molecular Beam Epitaxy Scalable Growth of Wafer‐Scale Continuous Semiconducting Monolayer MoTe₂ on Inert Amorphous Dielectrics

Abstract Monolayer MoTe₂, with the narrowest direct bandgap of ≈1.1 eV among Mo‐ and W‐based transition metal dichalcogenides, has attracted increasing attention as a promising candidate for applications in novel near‐infrared electronics and optoelectronics. Realizing 2D lateral growth is an essential prerequisite for uniform thickness and property control over the large scale, while it is not successful yet. Here, layer‐by‐layer growth of 2 in. wafer‐scale continuous monolayer 2H‐MoTe₂ films on inert SiO₂ dielectrics by molecular beam epitaxy is reported. A single‐step Mo‐flux controlled nucleation and growth process is developed to suppress island growth. Atomically flat 2H‐MoTe₂ with 100% monolayer coverage is successfully grown on inert 2 in. SiO₂/Si wafer, which exhibits highly uniform in‐plane structural continuity and excellent phonon‐limited carrier transport behavior. The dynamics‐controlled growth recipe is also extended to fabricate continuous monolayer 2H‐MoTe₂ on atomic‐layer‐deposited Al₂O₃ dielectric. With the breakthrough in growth of wafer‐scale continuous 2H‐MoTe₂ monolayers on device compatible dielectrics, batch fabrication of high‐mobility monolayer 2H‐MoTe₂ field‐effect transistors and the three‐level integration of vertically stacked monolayer 2H‐MoTe₂ transistor arrays for 3D circuitry are successfully demonstrated. This work provides novel insights into the scalable synthesis of monolayer 2H‐MoTe₂ films on universal substrates and paves the way for the ultimate miniaturization of electronics.