Source abstract
Abstract
Abstract Printed 2D materials, derived from solution‐processed inks, offer scalable and cost‐effective routes to mechanically flexible optoelectronics. With micrometer‐scale control and broad processing latitude, aerosol‐jet printing (AJP) is of particular interest for all‐printed circuits and systems. Here, AJP is utilized to achieve ultrahigh‐responsivity photodetectors consisting of well‐aligned, percolating networks of semiconducting MoS2 nanosheets and graphene electrodes on flexible polyimide substrates. Ultrathin (≈1.2 nm thick) and high‐aspect‐ratio (≈1 μm lateral size) MoS2 nanosheets are obtained by electrochemical intercalation followed by megasonic atomization during AJP, which not only aerosolizes the inks but also further exfoliates the nanosheets. The incorporation of the high‐boiling‐point solvent terpineol into the MoS2 ink is critical for achieving a highly aligned and flat thin‐film morphology following AJP as confirmed by grazing‐incidence wide‐angle X‐ray scattering and atomic force microscopy. Following AJP, curing is achieved with photonic annealing, which yields quasi‐ohmic contacts and photoactive channels with responsivities exceeding 103 A W−1 that outperform previously reported all‐printed visible‐light photodetectors by over three orders of magnitude. Megasonic exfoliation coupled with properly designed AJP ink formulations enables the superlative optoelectronic properties of ultrathin MoS2 nanosheets to be preserved and exploited for the scalable additive manufacturing of mechanically flexible optoelectronics.
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Research context
OpenAlex topics: 2D Materials and Applications · Advanced Sensor and Energy Harvesting Materials · MXene and MAX Phase Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Materials Science and Engineering Northwestern University Evanston IL 60208 USA
Applied Physics Graduate Program Northwestern University Evanston IL 60208 USA
National Institute of Standards and Technology Gaithersburg MD 20899 USA
National Synchrotron Light Source II Brookhaven National Laboratory Upton NY 11973 USA
Department of Chemistry Northwestern University Evanston IL 60208 USA
Department of Electrical and Computer Engineering Northwestern University Evanston IL 60208 USA
Funding
U.S. Department of Commerce · National Institute of Standards and Technology · National Science Foundation · Brookhaven National Laboratory
References (31)
Show source-provided references
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