journal article·2024-01Open access

A 2D Heterostructure‐Based Multifunctional Floating Gate Memory Device for Multimodal Reservoir Computing

Jiajia Zha, Yunpeng Xia, Shuhui Shi, Haoxin Huang, Siyuan Li, Chen Qian, Huide Wang, Peng Yang, Zhuomin Zhang, You Meng, Wei Wang, Zhengbao Yang, Hongyu Yu, Johnny C. Ho, Zhongrui Wang, Chaoliang Tan

Advanced Materials· Volume 36· Issue 3

Abstract

Abstract The demand for economical and efficient data processing has led to a surge of interest in neuromorphic computing based on emerging two‐dimensional (2D) materials in recent years. As a rising van der Waals (vdW) p‐type Weyl semiconductor with many intriguing properties, tellurium (Te) has been widely used in advanced electronics/optoelectronics. However, its application in floating gate (FG) memory devices for information processing has never been explored. Herein, an electronic/optoelectronic FG memory device enabled by Te‐based 2D vdW heterostructure for multimodal reservoir computing (RC) is reported. When subjected to intense electrical/optical stimuli, the device exhibits impressive nonvolatile electronic memory behaviors including ≈108 extinction ratio, ≈100 ns switching speed, >4000 cycles, >4000‐s retention stability, and nonvolatile multibit optoelectronic programmable characteristics. When the input stimuli weaken, the nonvolatile memory degrades into volatile memory. Leveraging these rich nonlinear dynamics, a multimodal RC system with high recognition accuracy of 90.77% for event‐type multimodal handwritten digit‐recognition is demonstrated.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Neural Networks and Reservoir Computing · Advanced Memory and Neural Computing · Neural dynamics and brain function

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials Science and Engineering City University of Hong Kong Hong Kong SAR 999077 China

Department of Electrical Engineering City University of Hong Kong Hong Kong SAR 999077 China

Department of Electrical and Electronic Engineering The University of Hong Kong Hong Kong SAR 999077 China

School of Microelectronics Southern University of Science and Technology Shenzhen Guangdong 518055 China

Department of Chemistry City University of Hong Kong Hong Kong SAR 999077 China

College of Integrated Circuits and Optoelectronic Chips Shenzhen Technology University Shenzhen Guangdong 518118 China

Department of Mechanical Engineering City University of Hong Kong Hong Kong SAR 999077 China

Department of Mechanical and Aerospace Engineering Hong Kong University of Science and Technology Hong Kong SAR 999077 China

References (56)

Show source-provided references
1. 10.1038/natrevmats.2016.4210.1038/natrevmats.2016.42 ↗
2. 10.1021/acs.chemrev.6b0055810.1021/acs.chemrev.6b00558 ↗
3. 10.1038/s41565-020-0724-310.1038/s41565-020-0724-3 ↗
4. 10.1038/s41565-020-0655-z10.1038/s41565-020-0655-z ↗
5. 10.1038/s41928-020-00473-w10.1038/s41928-020-00473-w ↗
6. 10.1002/adma.20210882610.1002/adma.202108826 ↗
7. Farronato M. · Adv. Mater. · 2022 · 34
8. 10.1126/sciadv.abg145510.1126/sciadv.abg1455 ↗
9. 10.1038/s41928-022-00847-210.1038/s41928-022-00847-2 ↗
10. 10.1038/s41565-021-00904-510.1038/s41565-021-00904-5 ↗
11. 10.1038/s41565-021-00921-410.1038/s41565-021-00921-4 ↗
12. 10.1038/s41467-021-21320-210.1038/s41467-021-21320-2 ↗
13. J. A.Carballo W. T. J.Chan P. A.Gargini A. B.Kahng S.Nath in2014 IEEE 32nd International Conference on Computer Design (ICCD) IEEE Seoul South Korea2014 p.139.
14. 10.1038/s41586-020-2861-010.1038/s41586-020-2861-0 ↗
15. 10.1038/s41928-022-00858-z10.1038/s41928-022-00858-z ↗
16. 10.1002/adfm.20200168810.1002/adfm.202001688 ↗
17. 10.1002/smll.20210445910.1002/smll.202104459 ↗
18. 10.1002/adma.20211027810.1002/adma.202110278 ↗
19. 10.1021/acsnano.8b0488510.1021/acsnano.8b04885 ↗
20. 10.1039/C8CS00598B10.1039/C8CS00598B ↗
21. 10.1039/C7CS00013H10.1039/C7CS00013H ↗
22. 10.1038/s41928-018-0058-410.1038/s41928-018-0058-4 ↗
23. 10.1021/acsnano.8b0342410.1021/acsnano.8b03424 ↗
24. 10.1038/s41565-019-0585-910.1038/s41565-019-0585-9 ↗
25. 10.1007/s40820-022-00852-210.1007/s40820-022-00852-2 ↗
26. 10.1002/adma.20221159810.1002/adma.202211598 ↗
27. 10.1126/sciadv.abn383710.1126/sciadv.abn3837 ↗
28. 10.1038/s41467-022-35396-x10.1038/s41467-022-35396-x ↗
29. 10.1103/PhysRevLett.114.20640110.1103/PhysRevLett.114.206401 ↗
30. 10.1002/pssb.20210062510.1002/pssb.202100625 ↗
31. 10.1021/acs.jpcc.8b0966510.1021/acs.jpcc.8b09665 ↗
32. 10.1002/adfm.20200781010.1002/adfm.202007810 ↗
33. 10.1103/PhysRev.146.54310.1103/PhysRev.146.543 ↗
34. 10.1002/adfm.20110211110.1002/adfm.201102111 ↗
35. Schroder D. · 2006
36. 10.1063/1.486853610.1063/1.4868536 ↗
37. 10.1038/s41699-018-0050-x10.1038/s41699-018-0050-x ↗
38. 10.1007/s12274-016-1118-610.1007/s12274-016-1118-6 ↗
39. 10.1103/PhysRevB.80.23540210.1103/PhysRevB.80.235402 ↗
40. 10.1002/adfm.20210257110.1002/adfm.202102571 ↗
41. 10.1002/adfm.20210547210.1002/adfm.202105472 ↗
42. 10.1021/acs.nanolett.1c0473710.1021/acs.nanolett.1c04737 ↗
43. 10.1002/aelm.20220038010.1002/aelm.202200380 ↗
44. 10.1103/PhysRevB.22.296810.1103/PhysRevB.22.2968 ↗
45. 10.1063/1.366204310.1063/1.3662043 ↗
46. 10.1016/j.mtphys.2017.07.00110.1016/j.mtphys.2017.07.001 ↗
47. 10.1038/s41565-018-0102-610.1038/s41565-018-0102-6 ↗
48. 10.1021/nn505941910.1021/nn5059419 ↗
49. 10.1515/nanoph-2019-054810.1515/nanoph-2019-0548 ↗
50. 10.1038/s41598-020-78767-410.1038/s41598-020-78767-4 ↗
51. 10.1038/s41467-020-20692-110.1038/s41467-020-20692-1 ↗
52. 10.1038/s41467-017-02337-y10.1038/s41467-017-02337-y ↗
53. 10.1039/D0NR03965A10.1039/D0NR03965A ↗
54. 10.1002/adma.20180707510.1002/adma.201807075 ↗
55. 10.1039/C9MH01923E10.1039/C9MH01923E ↗
56. 10.1002/adfm.20190289010.1002/adfm.201902890 ↗