Direct Bandgap Transition in Many‐Layer MoS₂ by Plasma‐Induced Layer Decoupling

We report a robust method for engineering the optoelectronic properties of many‐layer MoS₂ using low‐energy oxygen plasma treatment. Gas phase treatment of MoS₂ with oxygen radicals generated in an upstream N₂–O₂ plasma is shown to enhance the photoluminescence (PL) of many‐layer, mechanically exfoliated MoS₂ flakes by up to 20 times, without reducing the layer thickness of the material. A blueshift in the PL spectra and narrowing of linewidth are consistent with a transition of MoS₂ from indirect to direct bandgap material. Atomic force microscopy and Raman spectra reveal that the flake thickness actually increases as a result of the plasma treatment, indicating an increase in the interlayer separation in MoS₂. Ab initio calculations reveal that the increased interlayer separation is sufficient to decouple the electronic states in individual layers, leading to a transition from an indirect to direct gap semiconductor. With optimized plasma treatment parameters, we observed enhanced PL signals for 32 out of 35 many‐layer MoS₂ flakes (2–15 layers) tested, indicating that this method is robust and scalable. Monolayer MoS₂, while direct bandgap, has a small optical density, which limits its potential use in practical devices. The results presented here provide a material with the direct bandgap of monolayer MoS₂, without reducing sample thickness, and hence optical density.