journal article·2021-12Open access

Large Tunneling Magnetoresistance in van der Waals Ferromagnet/Semiconductor Heterojunctions

Wenkai Zhu, Hailong Lin, Faguang Yan, Ce Hu, Ziao Wang, Lixia Zhao, Yongcheng Deng, Zakhar R. Kudrynskyi, Tong Zhou, Zakhar D. Kovalyuk, Yuanhui Zheng, Amalia Patanè, Igor Žutić, Shushen Li, Houzhi Zheng, Kaiyou Wang

Advanced Materials· Volume 33· Issue 51

Abstract

Abstract 2D layered chalcogenide semiconductors have been proposed as a promising class of materials for low‐dimensional electronic, optoelectronic, and spintronic devices. Here, all‐2D van der Waals vertical spin‐valve devices, that combine the 2D layered semiconductor InSe as a spacer with the 2D layered ferromagnetic metal Fe3GeTe2 as spin injection and detection electrodes, are reported. Two distinct transport behaviors are observed: tunneling and metallic, which are assigned to the formation of a pinhole‐free tunnel barrier at the Fe3GeTe2/InSe interface and pinholes in the InSe spacer layer, respectively. For the tunneling device, a large magnetoresistance (MR) of 41% is obtained under an applied bias current of 0.1 µA at 10 K, which is about three times larger than that of the metallic device. Moreover, the tunneling device exhibits a lower operating bias current but a more sensitive bias current dependence than the metallic device. The MR and spin polarization of both the metallic and tunneling devices decrease with increasing temperature, which can be fitted well by Bloch's law. These findings reveal the critical role of pinholes in the MR of all‐2D van der Waals ferromagnet/semiconductor heterojunction devices.
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Research context

OpenAlex topics: 2D Materials and Applications · Quantum and electron transport phenomena · Graphene research and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Laboratory of Superlattices and Microstructures Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China

Center of Materials Science and Optoelectronics Engineering University of Chinese Academy of Sciences Beijing 100049 China

Tiangong University Tianjin 300387 China

School of Physics and Astronomy University of Nottingham Nottingham NG7 2RD UK

Department of Physics University at Buffalo State University of New York Buffalo NY 14260 USA

Frantsevich Institute for Problems of Materials Science The National Academy of Sciences of Ukraine, Chernivtsi Branch Chernivtsi 58001 Ukraine

Beijing Academy of Quantum Information Sciences Beijing 100193 China

Funding

National Key Research and Development Program of China · National Natural Science Foundation of China

References (52)

Show source-provided references
1. 10.1109/TMAG.2008.200306510.1109/TMAG.2008.2003065 ↗
2. 10.1103/PhysRevLett.99.17660210.1103/PhysRevLett.99.176602 ↗
3. 10.1103/PhysRevB.78.19541910.1103/PhysRevB.78.195419 ↗
4. 10.1103/PhysRevB.90.04140110.1103/PhysRevB.90.041401 ↗
5. 10.1039/C6CP01866A10.1039/C6CP01866A ↗
6. 10.1103/PhysRevB.93.24140110.1103/PhysRevB.93.241401 ↗
7. 10.1103/PhysRevApplied.5.04400310.1103/PhysRevApplied.5.044003 ↗
8. 10.1007/s12274-013-0314-x10.1007/s12274-013-0314-x ↗
9. 10.1021/nl300761610.1021/nl3007616 ↗
10. 10.1103/PhysRevB.89.18441810.1103/PhysRevB.89.184418 ↗
11. 10.1039/c3nr03168c10.1039/c3nr03168c ↗
12. 10.1103/PhysRevB.89.16541710.1103/PhysRevB.89.165417 ↗
13. 10.1016/j.jmmm.2017.01.05910.1016/j.jmmm.2017.01.059 ↗
14. 10.1088/2053-1583/aa745210.1088/2053-1583/aa7452 ↗
15. 10.1039/C8NR04518F10.1039/C8NR04518F ↗
16. 10.1063/1.494351610.1063/1.4943516 ↗
17. 10.1016/j.jmmm.2017.01.06610.1016/j.jmmm.2017.01.066 ↗
18. Xu L. · Adv. Condens. Matter Phys. · 2017 · 2017 · 9042823
19. 10.1021/acsnano.9b0817810.1021/acsnano.9b08178 ↗
20. 10.1088/1361-6463/aa650f10.1088/1361-6463/aa650f ↗
21. Zhang W. · ACS Nano · 2019 · 13 · 2253
22. 10.1002/ejic.20050102010.1002/ejic.200501020 ↗
23. 10.1126/science.aav445010.1126/science.aav4450 ↗
24. 10.1038/s41699-017-0033-310.1038/s41699-017-0033-3 ↗
25. 10.1038/s41563-018-0132-310.1038/s41563-018-0132-3 ↗
26. 10.1038/s41467-018-04018-w10.1038/s41467-018-04018-w ↗
27. 10.1021/acsami.0c1248310.1021/acsami.0c12483 ↗
28. 10.1021/acs.jpcc.0c0943210.1021/acs.jpcc.0c09432 ↗
29. 10.1021/acs.nanolett.9b0150610.1021/acs.nanolett.9b01506 ↗
30. 10.1021/acs.nanolett.0c0345210.1021/acs.nanolett.0c03452 ↗
31. 10.1021/acs.nanolett.8b0127810.1021/acs.nanolett.8b01278 ↗
32. 10.1016/j.scib.2020.03.03510.1016/j.scib.2020.03.035 ↗
33. 10.1063/5.001230510.1063/5.0012305 ↗
34. 10.1103/PhysRevB.89.20541610.1103/PhysRevB.89.205416 ↗
35. 10.1038/srep3961910.1038/srep39619 ↗
36. 10.1038/nnano.2016.24210.1038/nnano.2016.242 ↗
37. 10.1103/RevModPhys.76.32310.1103/RevModPhys.76.323 ↗
38. 10.1103/PhysRevB.58.322310.1103/PhysRevB.58.3223 ↗
39. 10.1063/1.131063310.1063/1.1310633 ↗
40. 10.1021/acs.nanolett.5b0155310.1021/acs.nanolett.5b01553 ↗
41. 10.1063/1.163334110.1063/1.1633341 ↗
42. 10.1063/1.281403810.1063/1.2814038 ↗
43. 10.1021/acsnano.8b0825310.1021/acsnano.8b08253 ↗
44. 10.1063/1.490373810.1063/1.4903738 ↗
45. 10.1063/1.36764410.1063/1.367644 ↗
46. 10.1016/0375-9601(75)90174-710.1016/0375-9601(75)90174-7 ↗
47. 10.1103/PhysRevB.37.66010.1103/PhysRevB.37.660 ↗
48. 10.1103/PhysRevB.58.R291710.1103/PhysRevB.58.R2917 ↗
49. 10.1103/PhysRevLett.94.17660110.1103/PhysRevLett.94.176601 ↗
50. 10.1109/TED.2011.217349810.1109/TED.2011.2173498 ↗
51. 10.1038/nature0583310.1038/nature05833 ↗
52. 10.1038/s41563-018-0149-710.1038/s41563-018-0149-7 ↗