Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers
Source abstract
Abstract
A universal block copolymer lithography is developed for a broad spectrum of materials including metals, semiconductors, ceramics, and polymers by combining advanced film deposition techniques with block copolymer lithography. The figure presents a nanopatterned platinum film prepared by applying universal block copolymer lithography.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Block Copolymer Self-Assembly · Advanced ceramic materials synthesis · Machine Learning in Materials Science
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (37)
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