Source abstract
Abstract
Due to the novel physical properties, high flexibility, and strong compatibility with Si‐based electronic techniques, 2D nonlayered structures have become one of the hottest topics. However, the realization of 2D structures from nonlayered crystals is still a critical challenge, which requires breaking the bulk crystal symmetry and guaranteeing the highly anisotropic crystal growth. CdTe owns a typical wurtzite crystal structure, which hinders the 2D anisotropic growth of hexagonal‐symmetry CdTe. Here, for the first time, the 2D anisotropic growth of ultrathin nonlayered CdTe as thin as 4.8 nm via an effective van der Waals epitaxy method is demonstrated. The anisotropic ratio exceeds 103. Highly crystalline nanosheets with uniform thickness and large lateral dimensions are obtained. The in situ fabricated ultrathin 2D CdTe photodetector shows ultralow dark current (≈100 fA), as well as high detectivity, stable photoswitching, and fast photoresponse speed (τrising = 18.4 ms, τdecay = 14.7 ms). Besides, benefitting from its 2D planar geometry, CdTe nanosheet exhibits high compatibility with flexible substrates and traditional microfabrication techniques, indicating its significant potential in the applications of flexible electronic and optoelectronic devices.
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Affiliations
CAS Center for Excellence in Nanoscience CAS Key Laboratory of Nanosystem and Hierarchical Fabrication National Center for Nanoscience and Technology Beijing 100190 P. R. China
University of Chinese Academy of Sciences Beijing 100049 P. R. China
Sino‐Danish Center for Education and Research Beijing 100190 P. R. China
CAS Center for Excellence in Nanoscience CAS Key Laboratory for Standardization and Measurement for Nanotechnology National Center for Nanoscience and Technology Beijing 100190 P. R. China
Funding
National Natural Science Foundation of China · Ministry of Science and Technology of the People's Republic of China · Chinese Academy of Sciences