journal article·2012-03-02Open access

Enhancement of Ferroelectric Polarization Stability by Interface Engineering

H. Lu, X. Liu, J. D. Burton, C.‐W. Bark, Y. Wang, Y. Zhang, D. J. Kim, A. Stamm, P. Lukashev, D. A. Felker, C. M. Folkman, P. Gao, M. S. Rzchowski, X. Q. Pan, C.‐B. Eom, E. Y. Tsymbal, A. Gruverman

Advanced Materials· Volume 24· Issue 9

Abstract

By using theoretical predictions based on first-principle calculations, we explore an interface engineering approach to stabilize polarization states in ferroelectric heterostructures with a thickness of just several nanometers. Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
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Research context

OpenAlex topics: Ferroelectric and Piezoelectric Materials · Multiferroics and related materials · Acoustic Wave Resonator Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (36)

Show source-provided references
1. 10.1007/978-3-662-04307-310.1007/978-3-662-04307-3 ↗
2. 10.1146/annurev.matsci.30.1.26310.1146/annurev.matsci.30.1.263 ↗
3. 10.1126/science.109250810.1126/science.1092508 ↗
4. 10.1126/science.112623010.1126/science.1126230 ↗
5. 10.1103/PhysRevLett.94.24680210.1103/PhysRevLett.94.246802 ↗
6. 10.1103/PhysRevB.72.12534110.1103/PhysRevB.72.125341 ↗
7. 10.1038/nature0812810.1038/nature08128 ↗
8. 10.1021/nl901754t10.1021/nl901754t ↗
9. 10.1063/1.213836510.1063/1.2138365 ↗
10. 10.1021/nl803318d10.1021/nl803318d ↗
11. 10.1126/science.118402810.1126/science.1184028 ↗
12. 10.1038/nature0150110.1038/nature01501 ↗
13. 10.1103/PhysRevLett.94.04760310.1103/PhysRevLett.94.047603 ↗
14. 10.1103/PhysRevLett.96.12760110.1103/PhysRevLett.96.127601 ↗
15. 10.1103/PhysRevLett.89.06760110.1103/PhysRevLett.89.067601 ↗
16. 10.1126/science.109825210.1126/science.1098252 ↗
17. 10.1103/PhysRevLett.96.13760210.1103/PhysRevLett.96.137602 ↗
18. 10.1103/PhysRevLett.100.17760110.1103/PhysRevLett.100.177601 ↗
19. 10.1063/1.233736310.1063/1.2337363 ↗
20. 10.1103/PhysRevB.63.12541110.1103/PhysRevB.63.125411 ↗
21. 10.1103/PhysRevLett.95.23760210.1103/PhysRevLett.95.237602 ↗
22. 10.1063/1.233700910.1063/1.2337009 ↗
23. 10.1021/nl052452l10.1021/nl052452l ↗
24. 10.1038/nmat242910.1038/nmat2429 ↗
25. 10.1103/PhysRevLett.98.20760110.1103/PhysRevLett.98.207601 ↗
26. 10.1073/pnas.071092810510.1073/pnas.0710928105 ↗
27. 10.1002/adma.20100464110.1002/adma.201004641 ↗
28. 10.1103/PhysRevB.20.106510.1103/PhysRevB.20.1065 ↗
29. X.Liu Y.Wang P. V.Lukashev J. D.Burton E. Y.Tsymbal The interface dipole effect on thin‐film ferroelectric stability: First‐principles and phenomenological modeling submitted.
30. 10.1126/science.110321810.1126/science.1103218 ↗
31. 10.1126/science.258.5089.176610.1126/science.258.5089.1766 ↗
32. Chang D. H. · J. Korean Phys. Soc. · 2001 · 38 · 277
33. 10.1080/1478644510856135410.1080/14786445108561354 ↗
34. 10.1063/1.290526610.1063/1.2905266 ↗
35. 10.1103/PhysRevLett.103.17760110.1103/PhysRevLett.103.177601 ↗
36. No sign of the EFM signal decay over the period of several hours has been detected suggesting high stability of the polarization states.