High–Performance Polarity–Reconfigurable Transistor and Photodiode via Asymmetric Transferred Schottky and Evaporated Ohmic Contacts
Source abstract
Abstract
Abstract Reconfigurable Schottky–junction devices (SJDs) have emerged as a promising solution to the doping challenges in 2D materials by exploiting polarity switching between n–/p–type transistor and intrinsic–n–type (I–N)/intrinsic–p–type (I–P) diode. However, symmetric Schottky barriers at both contacts limit unipolarity and reduce on–current. Here, a polarity–reconfigurable device (PRD) is presented that combines transferred Au bottom electrode (BE)/WSe 2 Schottky contact with evaporated Ti top electrode (TE)/WSe 2 Ohmic contact. This design enables operation in four distinct modes n–/p–type FET and I–N/I–P photodiode, controlled by drain and gate voltages. The transferred Au BE introduces a space gap that shifts the Au Fermi level toward the center of WSe 2 bandgap and forms high Schottky barrier for both electrons and holes, while the evaporated Ti TE increases Fermi–level pinning and forms an Ohmic barrier. These asymmetric barriers allow unipolar carrier transport through TE/WSe 2 Ohmic barrier by blocking opposite carriers at BE/WSe 2 Schottky barrier. The PRD achieves on/off ratios >10 6 in both FET modes, rectification >10 6 with near–unity ideality, and fast ≈3 µs photoresponse in both photodiode modes. By combining devices with different polarities, complementary systems are created, including inverter circuit (gain of 38), reconfigurable NAND/NOR logic gate circuit, and optoelectronic device for in–sensor image processing.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: 2D Materials and Applications · Topological Materials and Phenomena · Neural Networks and Reservoir Computing
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Electrical and Computer Engineering Sungkyunkwan University Suwon 16419 Republic of Korea
Department of Energy Science Sungkyunkwan University Suwon 16419 Republic of Korea
Department of Semiconductor and Display Engineering Sungkyunkwan University Suwon 16419 Republic of Korea
Semiconductor R&D Center Samsung Electronics Hwaseong 18448 Republic of Korea
Department of Electrical Engineering University at Buffalo The State University of New York Buffalo NY 14260 USA
Funding
National Research Foundation of Korea
References (77)
Show source-provided references
1. 10.1038/s41565-024-01695-110.1038/s41565-024-01695-1 ↗
2. 10.1002/adma.20210688610.1002/adma.202106886 ↗
3. 10.1038/s41563-022-01383-210.1038/s41563-022-01383-2 ↗
4. 10.1038/s41586-021-03339-z10.1038/s41586-021-03339-z ↗
5. 10.1038/s41586-023-06145-x10.1038/s41586-023-06145-x ↗
6. 10.1038/s41565-020-0724-310.1038/s41565-020-0724-3 ↗
7. 10.1038/natrevmats.2016.5210.1038/natrevmats.2016.52 ↗
8. 10.1002/smll.20160429810.1002/smll.201604298 ↗
9. 10.1038/nmat351810.1038/nmat3518 ↗
10. 10.1038/s41467-023-38667-310.1038/s41467-023-38667-3 ↗
11. 10.1016/j.apsusc.2024.16070610.1016/j.apsusc.2024.160706 ↗
12. 10.1038/ncomms1272510.1038/ncomms12725 ↗
13. 10.1039/C5CS00106D10.1039/C5CS00106D ↗
14. 10.1002/adfm.20180380710.1002/adfm.201803807 ↗
15. 10.1038/nnano.2014.21510.1038/nnano.2014.215 ↗
16. 10.1002/sstr.20230040110.1002/sstr.202300401 ↗
17. 10.1038/nnano.2013.21910.1038/nnano.2013.219 ↗
18. 10.1038/s41586-018-0129-810.1038/s41586-018-0129-8 ↗
19. 10.1038/s41467-020-15776-x10.1038/s41467-020-15776-x ↗
20. 10.1038/s41928-022-00858-z10.1038/s41928-022-00858-z ↗
21. 10.1002/inf2.1235510.1002/inf2.12355 ↗
22. M. C.Nguyen N. T.Duong H. W.Yun V. D.Do V. T.Vu W. K.Kim V. K.Dat H.Li W. J.Yu presented at2025 IEEE European Solid‐State Electronics Research Conference (ESSERC) Munich Germany September2025 pp.245–248 https://doi.org/10.1109/ESSERC66193.2025.11213978.10.1109/ESSERC66193.2025.11213978 ↗
23. 10.1038/s41928-023-01056-110.1038/s41928-023-01056-1 ↗
24. 10.1038/s41565-023-01446-810.1038/s41565-023-01446-8 ↗
25. 10.1038/s41563-023-01676-010.1038/s41563-023-01676-0 ↗
26. 10.1021/acsnano.4c1023110.1021/acsnano.4c10231 ↗
27. 10.1038/nnano.2017.10410.1038/nnano.2017.104 ↗
28. Wang H. · Adv. Mater. · 2023 · 35
29. 10.1021/acsnano.9b0281710.1021/acsnano.9b02817 ↗
30. 10.1021/acs.nanolett.7b0314010.1021/acs.nanolett.7b03140 ↗
31. 10.1021/acs.nanolett.1c0473710.1021/acs.nanolett.1c04737 ↗
32. 10.1007/s12274-022-4070-710.1007/s12274-022-4070-7 ↗
33. 10.1021/acs.nanolett.3c0350010.1021/acs.nanolett.3c03500 ↗
34. 10.1038/nnano.2014.2510.1038/nnano.2014.25 ↗
35. 10.1038/s41928-020-0433-910.1038/s41928-020-0433-9 ↗
36. 10.1021/acs.nanolett.1c0473710.1021/acs.nanolett.1c04737 ↗
37. 10.1038/ncomms756410.1038/ncomms7564 ↗
38. 10.1038/s41467-023-39705-w10.1038/s41467-023-39705-w ↗
39. 10.1021/acsnano.2c1059310.1021/acsnano.2c10593 ↗
40. Kwak D. H. · Adv. Opt. Mater. · 2019 · 7
41. Du J. · Adv. Funct. Mater. · 2021 · 31
42. 10.1021/acs.nanolett.9b0492610.1021/acs.nanolett.9b04926 ↗
43. 10.1038/s41928-022-00747-510.1038/s41928-022-00747-5 ↗
44. 10.1038/s41928-024-01124-010.1038/s41928-024-01124-0 ↗
45. 10.1002/adma.20250001110.1002/adma.202500011 ↗
46. 10.1038/s41586-021-03949-710.1038/s41586-021-03949-7 ↗
47. 10.1021/acsnano.6b0715910.1021/acsnano.6b07159 ↗
48. 10.1002/aelm.20200121210.1002/aelm.202001212 ↗
49. Hong C. · Adv. Funct. Mater. · 2024 · 34
50. 10.1021/acsami.9b1859110.1021/acsami.9b18591 ↗
51. 10.1016/j.xcrp.2020.10029810.1016/j.xcrp.2020.100298 ↗
52. Jang J. · Adv. Mater. · 2022 · 34
53. 10.1038/s41928-022-00746-610.1038/s41928-022-00746-6 ↗
54. 10.1021/acsnano.0c0432910.1021/acsnano.0c04329 ↗
55. C. M.Went J.Wong P. R.Jahelka M.Kelzenberg S.Biswas M. S.Hunt A.Carbone H. A.Atwater S.Adv 2019 5 aax6061.10.1126/sciadv.aax6061 ↗
56. Kwon G. · Small Methods · 2023 · 7
57. 10.1038/nnano.2013.4610.1038/nnano.2013.46 ↗
58. Fan J. H. · J. Appl. Phys. · 2014 · 115
59. 10.1021/nn504088g10.1021/nn504088g ↗
60. 10.1002/smll.20100162810.1002/smll.201001628 ↗
61. Sun J. · Adv. Mater. · 2020 · 32
62. 10.1038/nmat445210.1038/nmat4452 ↗
63. 10.1038/s41467-023-37635-110.1038/s41467-023-37635-1 ↗
64. 10.1038/s41928-022-00819-610.1038/s41928-022-00819-6 ↗
65. 10.1021/acs.nanolett.4c0167910.1021/acs.nanolett.4c01679 ↗
66. 10.1038/s41928-023-01055-210.1038/s41928-023-01055-2 ↗
67. 10.1038/s41586-020-2038-x10.1038/s41586-020-2038-x ↗
68. 10.1002/aelm.20230051710.1002/aelm.202300517 ↗
69. 10.1021/acsnano.4c0227810.1021/acsnano.4c02278 ↗
70. Wan T. · Adv. Mater. · 2023 · 35
71. 10.1038/s41928-020-00501-910.1038/s41928-020-00501-9 ↗
72. 10.1002/advs.20230344710.1002/advs.202303447 ↗
73. C.‐Y.Wang S.‐J.Liang S.Wang P.Wang Li Z.Wang A.Gao C.Pan C.Liu J.Liu H.Yang X.Liu W.Song C.Wang B.Cheng X.Wang K.Chen Z.Wang K.Watanabe T.Taniguchi J.Joshua Yang F.Miao S.Adv 2020 6 aba6173.10.1126/sciadv.aba6173 ↗
74. 10.1038/s41586-020-1942-410.1038/s41586-020-1942-4 ↗
75. 10.1038/s41928-017-0002-z10.1038/s41928-017-0002-z ↗
76. Jang H. · Adv. Mater. · 2020 · 32
77. 10.1088/2053-1583/aab67210.1088/2053-1583/aab672 ↗