journal article·2023-08

Amorphous oxide semiconductors: From fundamental properties to practical applications

Bojing Lu, Fei Zhuge, Yi Zhao, Yu-Jia Zeng, Liqiang Zhang, Jingyun Huang, Zhizhen Ye, Jianguo Lu

Publisher page

Abstract

Amorphous oxide semiconductors (AOSs) have exceptional features of high visible transparency, high carrier mobility, excellent uniformity, and low-temperature growth process, making them promising in the electronic and information industry. InGaZnO is the most widely studied AOS and has been applied in commercial, which, however, contains rare and precious indium. For sustainable development, a diversity of In-free AOSs have been designed and proposed, which are attracted more and more attention. There have been several reviews on AOSs mainly centred on InGaZnO; in contrast, the review on In-free AOSs is not available at present. In this work, we provide a comprehensive review on In-free AOSs from fundamental properties to practical applications. Various In-free AOSs available in literatures are introduced, with the focus on ZnSnO-based AOSs. Thin-film transistors (TFTs) based on In-free AOSs are investigated in detail, which are the key device for next-generation transparent and flexible displays. Also, the applications in transparent electrodes, sensors, memristors, synaptic devices, and circuits are introduced. This review is expected to provide a guide to well understand the state-of-the-art principles, materials, devices, fabrication, applications, and perspectives of In-free AOSs.
Source: expertdata · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Thin-Film Transistor Technologies · ZnO doping and properties · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (100+)

Show source-provided references
1. Mott · 1979
2. Elliott · 1983
3. Substitutional doping of amorphous silicon10.1016/0038-1098(75)90284-7 ↗
4. Amorphous-silicon field-effect device and possible application10.1049/el:19790126 ↗
5. Evolution of electrical performance of ZnO-based thin-film transistors by low temperature annealing10.1063/1.4711046 ↗
6. Instability induced by ultraviolet light in ZnO thin-film transistors10.1109/TED.2014.2312947 ↗
7. Working hypothesis to explore novel wide band gap electrically conducting amorphous oxides and examples10.1016/0022-3093(96)80019-6 ↗
8. Ionic amorphous oxide semiconductors: Material design, carrier transport, and device application10.1016/j.jnoncrysol.2006.01.073 ↗
9. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors10.1038/nature03090 ↗
10. Back-end-of-line compatible fully depleted CMOS inverters employing Ge p-FETs and α-InGaZnO n-FETs10.1109/LED.2021.3109343 ↗
11. Indium statistics and information, n.d. https://www.usgs.gov/centers/nmic/indium-statistics-and-information (accessed May 28, 2021).
12. High mobility transparent thin-film transistors with amorphous zinc tin oxide channel layer10.1063/1.1843286 ↗
13. High-performance flexible zinc tin oxide field-effect transistors10.1063/1.2120895 ↗
14. High-performance, spin-coated zinc tin oxide thin-Film transistors10.1149/1.2666588 ↗
15. Stability of transparent zinc tin oxide transistors under bias stress10.1063/1.2458457 ↗
16. The influence of visible light on transparent zinc tin oxide thin film transistors10.1063/1.2806934 ↗
17. T. Riedl, P. Görrn, P. Hölzer, W. Kowalsky, Ultra-high long-term stability of oxide-TTFTs under current stress, Phys. Status Solidi RRL – Rapid Res. Lett. 1 (2007) 175–177. https://doi.org/10.1002/pssr.200701129.10.1002/pssr.200701129 ↗
18. Zinc tin oxide transistors on flexible substrates10.1016/j.jnoncrysol.2005.11.080 ↗
19. Transparent Electronics10.1126/science.1085276 ↗
20. Amorphous InGaZnO and metal oxide semiconductor devices: an overview and current status10.1039/C9TC03933C ↗
21. Comprehensive review on amorphous oxide semiconductor thin film transistor10.1007/s42341-020-00197-w ↗
22. Recent advances in understanding the structure and properties of amorphous oxide semiconductors10.1002/aelm.201700082 ↗
23. Oxide semiconductor thin-film transistors: a review of recent advances10.1002/adma.201103228 ↗
24. Present status of amorphous In-Ga-Zn-O thin-film transistors10.1088/1468-6996/11/4/044305 ↗
25. Ab initio study on the structural characteristics of amorphous Zn2SnO410.1063/1.4850895 ↗
26. a theoretical study on the pressure-induced phase transitions in the inverse spinel structure Zn2SnO410.1021/jp2006606 ↗
27. A polar oxide ZnSnO3 with a LiNbO3-type structure10.1021/ja801843v ↗
28. Electronic structure of oxygen deficient amorphous oxide semiconductor a-InGaZnO4–x : Optical analyses and first-principle calculations10.1002/pssc.200779300 ↗
29. Electronic structure of the amorphous oxide semiconductor a-InGaZnO4–x : Tauc-Lorentz optical model and origins of subgap states10.1002/pssa.200881303 ↗
30. Local coordination structure and electronic structure of the large electron mobility amorphous oxide semiconductor In-Ga-Zn-O: Experiment and ab initio calculations10.1103/PhysRevB.75.035212 ↗
31. First-principle study of amorphous SiZnSnO thin-film transistor with excellent stability10.1016/j.tsf.2013.02.033 ↗
32. Atomic and electronic structures of a-ZnSnO3/a-SiO2 interface by ab initio molecular dynamics simulations10.1002/pssb.201600104 ↗
33. Grazing incidence X-ray absorption characterization of amorphous Zn-Sn-O thin film10.1088/1742-6596/712/1/012116 ↗
34. Role of Si as carrier suppressor in amorphous Zn–Sn–O10.1016/j.cap.2012.05.044 ↗
35. Structural and physical properties of transparent conducting, amorphous Zn-doped SnO2 films10.1063/1.4861378 ↗
36. Mott · 2012
37. Drift-mobility measurements and mobility edges in disordered silicons10.1088/0953-8984/16/44/023 ↗
38. Electronic properties of amorphous zinc tin oxide films by junction capacitance methods10.1016/j.jnoncrysol.2007.09.062 ↗
39. Mapping out the distribution of electronic states in the mobility gap of amorphous zinc tin oxide10.1063/1.3262962 ↗
40. Optical and electrical properties of amorphous zinc tin oxide thin films examined for thin film transistor application
41. Analysis of electronic subgap states in amorphous semiconductor oxides based on the example of Zn-Sn-O systems10.1103/PhysRevB.86.165210 ↗
42. Density-functional theory study of stability and subgap states of crystalline and amorphous Zn–Sn–O10.1016/j.tsf.2013.05.146 ↗
43. Prediction of subgap states in Zn- and Sn-based oxides using various exchange-correlation functionals10.1103/PhysRevB.90.195142 ↗
44. Enhancing the optoelectronic properties of amorphous zinc tin oxide by subgap defect passivation: A theoretical and experimental demonstration10.1103/PhysRevB.95.245204 ↗
45. 2006
46. J. Tauc, Optical properties of amorphous semiconductors. Amorph. Liq. Semicond., Springer US, Boston, MA, 1974, p. 159–220. https://doi.org/10.1007/978-1-4615-8705-7_4.10.1007/978-1-4615-8705-7_4 ↗
47. Characterization of amorphous Si-Zn-Sn-O thin films and applications in thin-film transistors
48. Thin-film transistors based on amorphous ZnNbSnO films with enhanced behaviors10.1109/TED.2016.2555848 ↗
49. Size effects on the photophysical properties of colloidal anatase TiO2 particles: size quantization versus direct transitions in this indirect semiconductor?10.1021/j100045a026 ↗
50. Improvement of the long-term stability of ZnSnO thin film transistors by tungsten incorporation using a solution-process method10.1039/C8RA02925C ↗
51. The TFT a new thin-film transistor10.1109/JRPROC.1962.288190 ↗
52. A tin oxide field-effect transistor10.1016/0038-1101(64)90057-7 ↗
53. Thin-film transistor fabricated in single-crystalline transparent oxide semiconductor10.1126/science.1083212 ↗
54. Effects of channel stoichiometry and processing temperature on the electrical characteristics of zinc tin oxide thin-film transistors10.1016/j.sse.2006.03.004 ↗
55. Metal oxide semiconductor thin-film transistors for flexible electronics10.1063/1.4953034 ↗
56. Review of recent developments in amorphous oxide semiconductor thin-film transistor devices10.1016/j.tsf.2011.07.018 ↗
57. Polycrystalline silicon thin film transistors10.1088/0268-1242/10/6/001 ↗
58. Double gate GaInZnO thin film transistors10.1063/1.2967456 ↗
59. Flexible double gate a-IGZO TFT fabricated on free standing polyimide foil10.1016/j.sse.2013.02.025 ↗
60. S.M. Sze, Y. Li, K.K. Ng, Physics of semiconductor devices, John Wiley & Sons, 2006.10.1002/0470068329 ↗
61. Modeling and simulation of insulated-gate field-effect transistor switching circuits10.1109/JSSC.1968.1049902 ↗
62. High-speed and low-voltage-driven shift register with self-aligned coplanar a-IGZO TFTs10.1109/LED.2012.2194133 ↗
63. Designing flexible, smart and self-sustainable supercapacitors for portable/wearable electronics: from conductive polymers10.1039/D1CS00800E ↗
64. Al-Zn-Sn-O Thin Film Transistors with Top and Bottom Gate Structure for AMOLED10.1587/transele.E92.C.1340 ↗
65. Origins of high mobility and low operation voltage of amorphous oxide TFTs: electronic structure, electron transport, defects and doping10.1109/JDT.2009.2034559 ↗
66. Material characteristics and applications of transparent amorphous oxide semiconductors10.1038/asiamat.2010.5 ↗
67. High-performance hydrogenated amorphous-Si TFT for AMLCD and AMOLED applications10.1109/LED.2005.855405 ↗
68. High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering10.1063/1.2353811 ↗
69. Improvements in the device characteristics of amorphous indium gallium zinc oxide thin-film transistors by Ar plasma treatment10.1063/1.2753107 ↗
70. Novel oxide amorphous semiconductors: transparent conducting amorphous oxides10.1016/0022-3093(96)00367-5 ↗
71. Combinatorial study of zinc tin oxide thin-film transistors10.1063/1.2828862 ↗
72. High performance solution-processed amorphous zinc tin oxide thin film transistor
73. Solution-processed zinc tin oxide semiconductor for thin-film transistors10.1021/jp803475g ↗
74. Solution-processed zinc–tin oxide thin-film transistors with low interfacial trap density and improved performance10.1063/1.3454241 ↗
75. Impact of soft annealing on the performance of solution-processed amorphous zinc tin oxide thin-film transistors10.1021/am303235z ↗
76. Low-temperature fabrication of high-performance metal oxide thin-film electronics via combustion processing10.1038/nmat3011 ↗
77. Combustion-process derived comparable performances of Zn-(In:Sn)-O thin-film transistors with a complete miscibility10.1063/1.4896990 ↗
78. Preparation of zinc-tin-oxide thin film by using an atomic layer deposition methodology10.3938/jkps.57.1472 ↗
79. Atomic layer deposited zinc tin oxide channel for amorphous oxide thin film transistors10.1063/1.4752727 ↗
80. Solution-deposited sodium beta-alumina gate dielectrics for low-voltage and transparent field-effect transistors10.1038/nmat2560 ↗
81. T.S. Zhao, C. Zhao, C.Z. Zhao, W.Y. Xu, L. Yang, I.Z. Mitrovic, et al., Solution processed ZnSnO thin-film transistors with peroxide- aluminum oxide dielectric, in: 2019 Int. Conf. IC Des. Technol. ICICDT, Suzhou, China: IEEE; 2019, p. 1–4. https://doi.org/10.1109/ICICDT.2019.8790915.10.1109/ICICDT.2019.8790915 ↗
82. Dependence of device behaviours on oxygen vacancies in ZnSnO thin-film transistors10.1007/s00339-019-2646-1 ↗
83. Ultrathin amorphous ZnGexSnO films for high performance ultra-thin-film transistors10.1063/1.5031448 ↗
84. Ultra-thin-film transistors based on ultra-thin amorphous ZnSnO films10.1007/s00339-018-2280-3 ↗
85. High mobility indium free amorphous oxide thin film transistors10.1063/1.2937473 ↗
86. Transparent Al–Zn–Sn–O thin film transistors prepared at low temperature10.1063/1.2998612 ↗
87. Bias-stress-stable solution-processed oxide thin film transistors10.1021/am900787k ↗
88. Effect of Zr addition on ZnSnO thin-film transistors using a solution process10.1063/1.3524514 ↗
89. Improved negative bias illumination instability of sol-gel gallium zinc tin oxide thin film transistors10.1063/1.3646388 ↗
90. Improved bias stability of solution-processed ZnSnO thin-film transistors by Zr addition10.1149/2.019202esl ↗
91. Effect of Ti addition on the characteristics of titanium-zinc-tin-oxide thin-film transistors fabricated via a solution process10.1088/0022-3727/45/22/225103 ↗
92. Carrier-suppressing effect of mg in solution-processed Zn-Sn-O thin-film transistors10.1149/2.012203esl ↗
93. Effect of hafnium addition on Zn-Sn-O thin film transistors fabricated by solution process
94. Enhancement of solution-processed zinc tin oxide thin film transistors by silicon incorporation10.1116/1.4795760 ↗
95. Optical and electrical properties of Mg-doped zinc tin oxide films prepared by radio frequency magnetron sputtering10.1016/j.apsusc.2013.09.035 ↗
96. Effect of Al concentration on the electrical characteristics of solution-processed Al doped ZnSnO thin film transistors10.1016/j.ceramint.2014.01.098 ↗
97. Y. Yu, X. Gong, D. Liu, Y. Wang, J. Kang, High Performance of Y-doped Sn-Zn-O films fabricated by solution-process for amorphous thin film transistors, MRS Proc. 2014;1630:mrsf13-1630-o03-17. https://doi.org/10.1557/opl.2014.16.10.1557/opl.2014.16 ↗
98. Effect of strontium addition on stability of zinc-tin-oxide thin-film transistors fabricated by solution process10.1109/JDT.2014.2303148 ↗
99. Amorphous ZnAlSnO thin-film transistors by a combustion solution process for future displays10.1063/1.4906999 ↗
100. Temperature stress on a thin film transistor with a novel BaZnSnO semiconductor using a solution process10.1039/C4RA14222E ↗