Exploring the Leidenfrost Effect for the Deposition of High‐Quality In₂O₃ Layers via Spray Pyrolysis at Low Temperatures and Their Application in High Electron Mobility Transistors

The growth mechanism of indium oxide (In₂O₃) layers processed via spray pyrolysis of an aqueous precursor solution in the temperature range of 100–300 °C and the impact on their electron transporting properties are studied. Analysis of the droplet impingement sites on the substrate's surface as a function of its temperature reveals that Leidenfrost effect dominated boiling plays a crucial role in the growth of smooth, continuous, and highly crystalline In₂O₃ layers via a vapor phase‐like process. By careful optimization of the precursor formulation, deposition conditions, and choice of substrate, this effect is exploited and ultrathin and exceptionally smooth layers of In₂O₃ are grown over large area substrates at temperatures as low as 252 °C. Thin‐film transistors (TFTs) fabricated using these optimized In₂O₃ layers exhibit superior electron transport characteristics with the electron mobility reaching up to 40 cm² V⁻¹ s⁻¹, a value amongst the highest reported to date for solution‐processed In₂O₃ TFTs. The present work contributes enormously to the basic understanding of spray pyrolysis and highlights its tremendous potential for large‐volume manufacturing of high‐performance metal oxide thin‐film transistor electronics.