Combining Nanofocused X-Rays with Electrical Measurements at the NanoMAX Beamline
Source abstract
Abstract
The advent of nanofocused X-ray beams has allowed the study of single nanocrystals and complete nanoscale devices in a nondestructive manner, using techniques such as scanning transmission X-ray microscopy (STXM), X-ray fluorescence (XRF) and X-ray diffraction (XRD). Further insight into semiconductor devices can be achieved by combining these techniques with simultaneous electrical measurements. Here, we present a system for electrical biasing and current measurement of single nanostructure devices, which has been developed for the NanoMAX beamline at the fourth-generation synchrotron, MAX IV, Sweden. The system was tested on single InP nanowire devices. The mechanical stability was sufficient to collect scanning XRD and XRF maps with a 50 nm diameter focus. The dark noise of the current measurement system was about 3 fA, which allowed fly scan measurements of X-ray beam induced current (XBIC) in single nanowire devices.
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Research context
OpenAlex topics: Advanced Electron Microscopy Techniques and Applications · Advanced X-ray Imaging Techniques · Integrated Circuits and Semiconductor Failure Analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Synchrotron radiation research and NanoLund, Lund University, Lund 22100, Sweden
Solid state physics and NanoLund, Lund University, Lund 22100, Sweden
MAX IV laboratory, Lund University, Lund 22100, Sweden
Funding
Swedish Research Council
References (52)
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