journal article·2023-02Open access

Effect of Cyano Substitution on Non‐Fullerene Acceptor for Near‐Infrared Organic Photodetectors above 1000 nm

Jong‐Woon Ha, Hyeong Ju Eun, Byoungwook Park, Hyungju Ahn, Dong Ryeol Hwang, Yeong Seok Shim, Junseok Heo, Changjin Lee, Sung Cheol Yoon, Jong H. Kim, Seo‐Jin Ko

Advanced Functional Materials· Volume 33· Issue 8

Abstract

Abstract Near‐infrared organic photodetectors (NIR OPDs) comprising ultra‐narrow bandgap non‐fullerene acceptors (NFA, over 1000 nm) typically exhibit high dark current density under applied reverse bias. Therefore, suppression of dark current density is crucial to achieve high‐performance of such NIR OPDs. Herein, cyano (CN) with a strong electron‐withdrawing property is introduced into alkoxy thiophene as a π‐bridge to adjust its optoelectronic characteristics, and the correlation between dark current density and charge injection barrier is investigated. Compared with their motivated NFA (COTH), the novel CN‐substituted NFAs, COTCN and COTCN2, exhibited deeper‐lying highest occupied molecular orbital energy levels and narrower optical bandgap (<1.10 eV), owing to the strong inductive and resonance effect of CN. The dark current and total noise currents are minimized as the number of substituted CN increases because of the larger hole injection barrier. Consequently, PTB7‐Th:COTCN2 exhibited the best shot‐noise limited detectivity (D*sh, 1.18 × 1012 Jones) and total noise detectivity (D*n, 1.33 × 1011 Jones) compared with those of PTB7‐Th:COTH (D*sh, 2.47 × 1011 Jones and D*n, 1.96 × 1010 Jones).
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Research context

OpenAlex topics: Perovskite Materials and Applications · Organic Electronics and Photovoltaics · GaN-based semiconductor devices and materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Division of Advanced Materials Korea Research Institute of Chemical Technology (KRICT) 141 Gajeong‐ro, Yuseong‐gu Daejeon 34114 Republic of Korea

Department of Molecular Science and Technology Ajou University Suwon 16499 Republic of Korea

Pohang Accelerator Laboratory (PAL) Pohang University of Science and Technology (POSTECH) Pohang 790‐784 South Korea

Department of Advanced Materials Hannam University Daejeon 34054 Republic of Korea

Department of Electrical and Computer Engineering Ajou University Suwon 16499 Republic of Korea

Funding

National Research Foundation of Korea

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