Ultrathin Wafer Pre-Assembly and Assembly Process Technologies: A Review
Source abstract
Abstract
Ultrathin silicon wafer technology is reviewed in terms of the semiconductor applications, critical challenges, and wafer pre-assembly and assembly process technologies and their underlying mechanisms. Mechanical backgrinding has been the standard process for wafer thinning in the semiconductor industry owing to its low cost and productivity. As the thickness requirement of wafers is reduced to below 100 μm, many challenges are being faced due to wafer/die bow, mechanical strength, wafer handling, total thickness variation (TTV), dicing, and packaging assembly. Various ultrathin wafer processing and assembly technologies have been developed to address these challenges. These include wafer carrier systems to handle ultrathin wafers; backgrinding subsurface damage and surface roughness reduction, and post-grinding treatment to increase wafer/die strength; improved wafer carrier flatness and backgrinding auto-TTV control to improve TTV; wafer dicing technologies to reduce die sidewall damage to increase die strength; and assembly methods for die pick-up, die transfer, die attachment, and wire bonding. Where applicable, current process issues and limitations, and future work needed are highlighted.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · 3D IC and TSV technologies · Electronic Packaging and Soldering Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (82)
Show source-provided references
1. Sze S. M. · 1981
2. 10.1109/T-ED.1972.1736910.1109/T-ED.1972.17369 ↗
3. 10.1109/TEPM.2007.91421710.1109/TEPM.2007.914217 ↗
4. Savastiouk S. · Tru-Si Technologies report, April (2001); http://asia.stanford.edu/events/spring01/slides/savastioukslides.ppt
5. 10.1016/j.ijmachtools.2008.05.00910.1016/j.ijmachtools.2008.05.009 ↗
6. Kroninger W. · 2009 · 21910.1007/978-0-387-78219-5_6 ↗
7. Reiche M. · Adv. Pack. · 2003 · 12 · 29
8. Banerjee G. · Electrochem. Soc. (ECS) Trans. · 2008 · 13 · 1
9. Blake L. H. · Solid State Technology · 1970 · 13 · 42
10. Fury M. A. · Electrochem. Soc. (ECS) Trans. · 2009 · 19 · 3
11. Schraub F. A. T. · Solid State Technol. · 2002 · 45 · 59
12. Starzynski J. S. · Solid State Technol. · 2005 · 48 · 60
13. Kruwinus H. J. · European Semiconductor · 1995 · 1
14. Yellowaga D. · NSTI-Nanotech · 2005 · 457
15. Savastiouk S. · Solid State Technol. · 1998 · 41 · 133
16. 10.1109/TCHMT.1983.113619610.1109/TCHMT.1983.1136196 ↗
17. Heinen G. · 1st International SAMPE Electronics Conference · 1987 · 1 · 264
18. Halahan P. · Chip Scale Review · 2002
19. 10.1007/s00170-005-2508-110.1007/s00170-005-2508-1 ↗
20. 10.1016/0141-6359(94)90199-610.1016/0141-6359(94)90199-6 ↗
21. Hadamovsky H. F. · Deutscher Verlag für Grundstoffindustrie · 1985 · 74
22. Gert L. M. · Phys. Chem. Mechan. Surf. · 1984 · 2 · 583
23. 10.1016/0921-5093(95)10148-910.1016/0921-5093(95)10148-9 ↗
24. 10.1016/S0890-6955(98)00079-010.1016/S0890-6955(98)00079-0 ↗
25. 10.4028/www.scientific.net/AMR.126-128.11310.4028/www.scientific.net/AMR.126-128.113 ↗
26. 10.1016/S0141-6359(00)00032-510.1016/S0141-6359(00)00032-5 ↗
27. Timoshenko S. · 1961
28. 10.1016/j.mee.2012.08.01610.1016/j.mee.2012.08.016 ↗
29. Farrens S. N. · Electrochem. Soc. (ECS) Trans. · 2010 · 27 · 801
30. 10.1116/1.370023010.1116/1.3700230 ↗
31. 10.1016/j.optlaseng.2009.01.00910.1016/j.optlaseng.2009.01.009 ↗
32. 10.1007/s00170-006-0800-310.1007/s00170-006-0800-3 ↗
33. Matsui S. · Bull. Japan Soc. Precis. Eng. · 1988 · 22 · 295
34. 10.1016/j.ijmachtools.2004.06.01310.1016/j.ijmachtools.2004.06.013 ↗
35. 10.1016/j.mee.2012.10.02510.1016/j.mee.2012.10.025 ↗
36. 10.1016/j.ijmachtools.2006.02.00310.1016/j.ijmachtools.2006.02.003 ↗
37. Salmon S. C. · 1992
38. 2011
39. 10.4028/www.scientific.net/KEM.250.9410.4028/www.scientific.net/KEM.250.94 ↗
40. 10.1016/S0007-8506(07)61065-810.1016/S0007-8506(07)61065-8 ↗
41. Liu J. H. · Int. J. Mach. Tools Manufact. · 2007 · 47 · 3
42. 2013
43. 10.1147/JRD.2008.538856410.1147/JRD.2008.5388564 ↗
44. F. Shimura,Semiconductor Silicon Crystal Technology, Academic Press, San Diego, pp.184–186 (1989).
45. Mauer L. · SSEC Technical Report · 2009
46. Vita P. · 2012 · 4446.1
47. 10.1149/1.139317210.1149/1.1393172 ↗
48. D. L. Flamm,Introduction to Plasma Chemistry,Plasma Etching: An Introduction, D. M. Manos and D. L. Flamm, Eds. Academic Press, San Diego, pp. 91–178 (1989).
49. 10.1351/pac19906209170910.1351/pac199062091709 ↗
50. Siniaguine O. · IEEE/CPMT International Manufacturing Technology Symposium · 1998 · 139
51. 10.1143/JJAP.42.58710.1143/JJAP.42.587 ↗
52. 10.1016/j.mser.2004.06.00210.1016/j.mser.2004.06.002 ↗
53. 10.1016/S0167-9317(03)00398-810.1016/S0167-9317(03)00398-8 ↗
54. Li S. H. · 2000 · 63
55. Bai D. · Electrochem. Soc. (ECS) Trans. · 2009 · 18 · 757
56. Levinson G. · Advanced Dicing Technologies · 2005
57. 10.1109/TSM.2004.84183210.1109/TSM.2004.841832 ↗
58. 10.1109/TADVP.2003.82108410.1109/TADVP.2003.821084 ↗
59. Albalak R. J. · Adv. Dicing Technol. · 2006
60. Schmitt F. · 2011 · 2110.1007/978-1-4419-7276-7_3 ↗
61. Landesberger C. · 2011 · 3310.1007/978-1-4419-7276-7_4 ↗
62. Ion J. C. · 2005
63. 10.1109/JQE.1972.107693710.1109/JQE.1972.1076937 ↗
64. 10.1109/JQE.1973.107752910.1109/JQE.1973.1077529 ↗
65. 10.1007/s00170-006-0454-110.1007/s00170-006-0454-1 ↗
66. Albalak R. J. · Adv. Dicing Technol. · 2006
67. 10.2961/jlmn.2006.01.001610.2961/jlmn.2006.01.0016 ↗
68. 10.1088/0960-1317/17/12/01710.1088/0960-1317/17/12/017 ↗
69. 10.1088/0022-3727/39/12/02310.1088/0022-3727/39/12/023 ↗
70. 10.2961/jlmn.2008.03.000210.2961/jlmn.2008.03.0002 ↗
71. Borkulo J. · Electrochem. Soc. (ECS) Trans. · 2009 · 18 · 837
72. Pettigrew K. · Chip Scale Review · 2011 · 22
73. Mai T. A. · Industr. Laser Solut. · 2008 · 23 · 16
74. Richerzhagen B. · Proceedings of SPIE - The International Society for Optical Engineering · 2003 · 4830 · 91
75. Kroninger W. · Semiconduct. Int. · 2005 · 28 · 4
76. Perrottet D. · Proceedings of SPIE - The International Society for Optical Engineering · 2005 · 5713 · 285
77. Ohmura E. · J. Achieve. Mater. Manufact. Eng. · 2006 · 17 · 1
78. Ohmura E. · 2011 · 29
79. Schnegg F. · 2011 · 16710.1007/978-1-4419-7276-7_15 ↗
80. 10.1109/TCPMT.2010.210043210.1109/TCPMT.2010.2100432 ↗
81. Edwards D. · Electronic Design · 2012
82. 10.1063/1.140009610.1063/1.1400096 ↗