journal article·2024-10Open access

A System Built for Both Deterministic Transfer Processes and Contact Photolithography

Huandong Chen, Jayakanth Ravichandran

Advanced Engineering Materials· Volume 26· Issue 20

Abstract

A home‐built compact system that functions as both a transfer stage for deterministic transfer processes and a mask aligner for contact photolithography, is constructed. The precision translation sample stage and optical microscope are shared between the two modes. In the transfer mode, assisted by either an adhesive or a heating element, the setup has been used to deterministically transfer freestanding semiconductors, 2D materials, and van der Waals electrodes. When configured in photolithography mode, the proposed instrument has been employed to fabricate various microscale patterns and devices, with minimum feature sizes of 1–2 μm achieved. The prototype instrument provides a feasible solution for performing high‐quality deterministic transfer and photolithography processes on one single tool in‐house.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Advancements in Photolithography Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Mork Family Department of Chemical Engineering and Materials Science University of Southern California Los Angeles CA 90089 USA

Ming Hsieh Department of Electrical and Computer Engineering University of Southern California Los Angeles CA 90089 USA

Core Center for Excellence in Nano Imaging University of Southern California Los Angeles CA 90089 USA

Funding

Army Research Office

References (31)

Show source-provided references
1. 10.1002/adma.20120138610.1002/adma.201201386 ↗
2. 10.1002/adom.20150036510.1002/adom.201500365 ↗
3. 10.1088/2053-1583/ab762910.1088/2053-1583/ab7629 ↗
4. 10.3390/nano902028310.3390/nano9020283 ↗
5. Zhang J. · APL Photonics · 2019 · 4 · 11
6. 10.1063/1.508726310.1063/1.5087263 ↗
7. 10.1038/nature0905410.1038/nature09054 ↗
8. 10.1021/acsnano.6b0760510.1021/acsnano.6b07605 ↗
9. 10.1039/C7CS00556C10.1039/C7CS00556C ↗
10. 10.1126/science.aac943910.1126/science.aac9439 ↗
11. 10.1063/1.508094710.1063/1.5080947 ↗
12. 10.1002/pip.312710.1002/pip.3127 ↗
13. 10.1021/acsphotonics.8b0124510.1021/acsphotonics.8b01245 ↗
14. 10.1038/nenergy.2017.4310.1038/nenergy.2017.43 ↗
15. 10.1016/j.solmat.2009.03.02710.1016/j.solmat.2009.03.027 ↗
16. 10.1002/adma.20060222310.1002/adma.200602223 ↗
17. 10.1002/adfm.20120224910.1002/adfm.201202249 ↗
18. 10.1021/cm501002b10.1021/cm501002b ↗
19. 10.1038/s41928-022-00753-710.1038/s41928-022-00753-7 ↗
20. 10.1038/s41586-022-04588-210.1038/s41586-022-04588-2 ↗
21. 10.1126/science.aba141610.1126/science.aba1416 ↗
22. 10.1038/s41586-018-0129-810.1038/s41586-018-0129-8 ↗
23. 10.1038/s41928-021-00566-010.1038/s41928-021-00566-0 ↗
24. 10.1038/s41565-020-0729-y10.1038/s41565-020-0729-y ↗
25. 10.1021/acsenergylett.2c0151010.1021/acsenergylett.2c01510 ↗
26. 10.1021/acsaelm.2c0114910.1021/acsaelm.2c01149 ↗
27. 10.1021/acs.chemmater.1c0220210.1021/acs.chemmater.1c02202 ↗
28. 10.1002/adma.20230328310.1002/adma.202303283 ↗
29. 10.1002/aelm.20230046110.1002/aelm.202300461 ↗
30. 10.1088/2515-7639/ab6a7210.1088/2515-7639/ab6a72 ↗
31. 10.1021/acsomega.1c0158210.1021/acsomega.1c01582 ↗