journal article·2018-09Open access

Solution‐Processed Low‐Bandgap CuIn(S,Se)2 Absorbers for High‐Efficiency Single‐Junction and Monolithic Chalcopyrite‐Perovskite Tandem Solar Cells

Alexander R. Uhl, Adharsh Rajagopal, James A. Clark, Anna Murray, Thomas Feurer, Stephan Buecheler, Alex K.‐Y. Jen, Hugh W. Hillhouse

Advanced Energy Materials· Volume 8· Issue 27

Abstract

Abstract A novel molecular‐ink deposition route based on thiourea and N,N‐dimethylformamide (DMF) that results in a certified solar cell efficiency world record for non‐vacuum deposited CuIn(S,Se)2 (CIS) absorbers and non‐vacuum deposited absorbers with a bandgap of 1.0 eV, is presented. It is found that by substituting the widely employed solvent dimethyl sulfoxide with DMF, the coordination chemistry of InCl3 could be altered, dramatically improving ink stability, enabling up to tenfold increased concentrations, omitting the necessity for elevated ink temperatures, and radically accelerating the deposition process. Furthermore, it is shown that by introducing compositionally graded precursor films, film porosity, compositional gradients, and the surface roughness of the absorbers are effectively reduced and device conversion efficiencies are increased up to 13.8% (13.1% certified, active area). The reduced roughness is also seen as crucial to realize monolithically interconnected CIS‐perovskite tandem devices, where semitransparent MAPbI3 devices are directly deposited on the CIS bottom cell. Confirming the feasibility of this approach, monolithic devices with near perfect voltage addition between subcells of up to 1.40 V are presented.
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Research context

OpenAlex topics: Perovskite Materials and Applications · Chalcogenide Semiconductor Thin Films · Quantum Dots Synthesis And Properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Chemical Engineering Molecular Engineering and Sciences Institute University of Washington Seattle WA 98195‐1652 USA

Laboratory of Photonics and Interfaces (LPI) École Polytechnique Fédérale de Lausanne (EPFL) Lausanne 1015 Switzerland

Department of Materials Science and Engineering University of Washington Seattle WA 98195‐2120 USA

Laboratory for Thin Films and Photovoltaics Empa – Swiss Federal Laboratories for Materials Science and Technology 8600 Dübendorf Switzerland

Department of Materials Science and Engineering Department of Chemistry City University of Hong Kong Kowloon 999077 Hong Kong

Funding

Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung · U.S. Department of Energy

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