Energy-Band Structure as Basis for Semiconductor n-Bi2S3/n-Bi2O3 Photocatalyst Design
Source abstract
Abstract
By employing model semiconductor composite system n-type Bi 2 S 3 /n-type Bi 2 O 3 , and the concept of semiconductor electrochemistry, basic principles for the design of (photo)catalyst materials with application in energy conversion and advanced wastewater treatment processes, were analyzed and discussed. Absolute energy values of conduction band edge, E CB , and valence band edge, E VB , were correlated with the semiconductor's stability against decomposition and competitive redox reactions of free radical species formation. The energy-band diagrams were constructed for the proposed photocatalytic system. The E CB position was determined from the flatband potential, E FB , derived from Mott-Schottky analysis taking into account an additional potential drop in the Helmholtz layer due to the adsorption of potential determining ions on the semiconductor surface. Special attention was given to the accuracy of E FB calculation due to the frequency dispersion of the capacitance.
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Research context
OpenAlex topics: Advanced Photocatalysis Techniques · Gas Sensing Nanomaterials and Sensors · Chalcogenide Semiconductor Thin Films
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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