Semiconductor Electrodes: V . The Application of Chemically Vapor Deposited Iron Oxide Films to Photosensitized Electrolysis

The preparation of polycrystalline n‐type electrodes by the chemical vapor deposition (CVD) of iron oxide onto Ti and Pt substrates is reported. The behavior of these electrodes in aqueous solutions of different p H in the absence and presence of illumination is shown. Photoassisted electrolysis of water occurs at wavelengths longer than 400 nm and the current vs. wavelength curve for this process is compared to that of a CVD electrode.