Ferroelectric properties and structural characteristics of Mn and Zr co-substituted ZnO thin films
Source abstract
Abstract
Wurtzite-type ferroelectrics have garnered significant attention as next-generation memory materials due to their high remanent polarization and excellent scalability.However, reported ZnO-based ferroelectrics exhibit high coercive fields close to their dielectric breakdown voltage, resulting in poor insulation reliability.In this study, we investigated the effects of Mn and Zr co-substitution into Zn sites to identify new dopants capable of inducing observable ferroelectricity in ZnO.Thin films with compositions of Zn 1-x (Mn, Zr) x O (x = 0-0.20)were fabricated using pulsed laser deposition.X-ray diffraction analysis confirmed that both the c-axis length and the c/a ratio increased with the substitution concentration.Furthermore, polarization-electric field measurements successfully revealed distinct ferroelectric hysteresis loops for the compositions at x = 0.10 and x = 0.15.Although conventional ZnO-based ferroelectrics were reported to show the ferroelectricity by decrease of the c/a ratio, Zr and Mn co-substitution was revealed to induce ferroelectricity with an increase of the c/a ratio.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: ZnO doping and properties · Ferroelectric and Piezoelectric Materials · Multiferroics and related materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of Materials and Chemical Technology, Institute of Science Tokyo
References (36)
Show source-provided references
1. 1) K.-H. Kim, I. Karpov, R. H. Olsson and D. Jariwala, Nat. Nanotechnol. 18, 422 (2023).10.1038/s41565-023-01361-y ↗
2. 2) J. F. Scott, Science 315, 954 (2007).10.1126/science.1129564 ↗
3. 3) M. Lederer, T. Kämpfe, T. Ali, F. Müller, R. Olivo and R. Hoffmann, IEEE T. Electron Dev. 68, 2295 (2021).10.1109/TED.2021.3068716 ↗
4. 4) J. Y. Park, D.-H. Choe, D. H. Lee, G. T. Yu, K. Yang, S. H. Kim, G. H. Park, S.-G. Nam, H. J. Lee, S. Jo, B. J. Kuh, D. Ha, Y. Kim, J. Heo and M. H. Park, Adv. Mater. 35, 2204904 (2023).10.1002/adma.202204904 ↗
5. 5) T. Kitahara, S. Yasuhara and T. Hoshina, J. Ceram. Soc. Jpn. 132, 318 (2024).10.2109/jcersj2.23206 ↗
6. 6) H. Kohlstedt, N. A. Pertsev, J. Rodríguez Contreras and R. Waser, Phys. Rev. B 72, 125341 (2005).10.1103/PhysRevB.72.125341 ↗
7. 7) V. Garcia and M. Bibes, Nat. Commun. 5, 4289 (2014).10.1038/ncomms5289 ↗
8. 8) J. F. Ihlefeld, D. T. Harris, R. Keech, J. L. Jones, J.-P. Maria and S. Trolier-McKinstry, J. Am. Ceram. Soc. 99, 2537 (2016).10.1111/jace.14387 ↗
9. 9) V. Nagarajan, C. L. Jia, H. Kohlstedt, R. Waser, I. B. Misirlioglu, S. P. Alpay and R. Ramesh, Appl. Phys. Lett. 86, 192910 (2005).10.1063/1.1922579 ↗
10. 10) S. Yasuoka, T. Shimizu, A. Tateyama, M. Uehara, H. Yamada, M. Akiyama, Y. Hiranaga, Y. Cho and H. Funakubo, J. Appl. Phys. 128, 114103 (2020).10.1063/5.0015281 ↗
11. 11) R. Mizutani, S. Yasuoka, T. Shiraishi, T. Shimizu, M. Uehara, H. Yamada, M. Akiyama, O. Sakata and H. Funakubo, Appl. Phys. Express 14, 105501 (2021).10.35848/1882-0786/ac2261 ↗
12. 12) S. Yasuoka, R. Mizutani, R. Ota, T. Shiraishi, T. Shimizu, S. Yasui, Y. Ehara, K. Nishida, M. Uehara, H. Yamada, M. Akiyama, Y. Imai, O. Sakata and H. Funakubo, J. Ceram. Soc. Jpn. 130, 436 (2022).10.2109/jcersj2.21184 ↗
13. 13) A. Konishi, T. Ogawa, C. A. J. Fisher, A. Kuwabara, T. Shimizu, S. Yasui, M. Itoh and H. Moriwake, Appl. Phys. Lett. 109, 102903 (2016).10.1063/1.4962440 ↗
14. 14) L. Li and M. Wu, ACS Nano 11, 6382 (2017).10.1021/acsnano.7b02756 ↗
15. 15) H. Moriwake, A. Konishi, T. Ogawa, K. Fujimura, C. A. J. Fisher, A. Kuwabara, T. Shimizu, S. Yasui and M. Itoh, Appl. Phys. Lett. 104, 242909 (2014).10.1063/1.4884596 ↗
16. 16) S. Fichtner, N. Wolff, F. Lofink, L. Kienle and B. Wagner, J. Appl. Phys. 125, 114103 (2019).10.1063/1.5084945 ↗
17. 17) J. Hayden, M. D. Hossain, Y. Xiong, K. Ferri, W. Zhu, M. V. Imperatore, N. Giebink, S. Trolier-McKinstry, I. Dabo and J.-P. Maria, Phys. Rev. Mater. 5, 044412 (2021).10.1103/PhysRevMaterials.5.044412 ↗
18. 18) D. Wang, P. Wang, B. Wang and Z. Mi, Appl. Phys. Lett. 119, 111902 (2021).10.1063/5.0060021 ↗
19. 19) M. Uehara, R. Mizutani, S. Yasuoka, T. Shiraishi, T. Shimizu, H. Yamada, M. Akiyama and H. Hunakubo, Appl. Phys. Lett. 119, 172901 (2021).10.1063/5.0068059 ↗
20. 20) K. Ferri, S. Bachu, W. Zhu, M. Imperatore, J. Hayden, N. Alem, N. Giebink, S. Trolier-McKinstry and J.-P. Maria, J. Appl. Phys. 130, 044101 (2021).10.1063/5.0053755 ↗
21. 21) R. Ogawa, A. Tamai, K. Tanaka, H. Adachi and I. Kanno, Jpn. J. Appl. Phys. 63, 010902 (2024).10.35848/1347-4065/ad1425 ↗
22. 22) K. Kaneko, T. Oga, S. Kaneko, T. Katase, M. Yoshimoto and A. Matsuda, J. Ceram. Soc. Jpn. 131, 383 (2023).10.2109/jcersj2.23022 ↗
23. 23) L. Liu, Z. Mei, A. Tang, A. Azarov, A. Kuznetsov, Q.-K. Xue and X. Du, Phys. Rev. B 93, 235305 (2016).
24. 24) W. Zhao, Y. Kang, J. Sui, T. Lv, B. Zhang, X. Wu, Y. Tong, X. Wang and D. Zhou, ACS Appl. Mater. Inter. 17, 57297 (2025).10.1021/acsami.5c14493 ↗
25. 25) L. Jacques, G. Ryu, S. Bachu, R. Taheri, P. Yousefian, S. Shetty, B. Akkopru-Akgun, C. Randall, N. Alem, J.-P. Maria and S. Trolier-McKinstry, J. Appl. Phys. 133, 224102 (2023).10.1063/5.0153750 ↗
26. 26) S. M. Baksa, S. Gelin, S. Oturak, R. J. Spurling, A. Sepehrinezhad, L. Jacques, S. Trolier-McKinstry, A. C. T. van Duin, J.-P. Maria, A. M. Rappe and I. Dabo, Adv. Electron. Mater. 11, 2400567 (2025).10.1002/aelm.202400567 ↗
27. 27) P. Kumar, H. K. Malik, A. Ghosh, R. Thangavel and K. Asokan, Appl. Phys. Lett. 102, 221903 (2013).10.1063/1.4809575 ↗
28. 28) M. N. H. Mia, M. F. Pervez, M. K. Hossain, M. Reefaz Rahman, M. J. Uddin, M. A. Al Mashud, H. K. Ghosh and M. Hoq, Results Phys. 7, 2683 (2017).10.1016/j.rinp.2017.07.047 ↗
29. 29) X. Wang, X. Zhao, M. Guo, H. Shen, B. Zhang, X. Lyu and Z. Guo, Ceram. Int. 50, 5311 (2024).10.1016/j.ceramint.2023.11.282 ↗
30. 30) W. M. H. Oo, L. V. Saraf, M. H. Engelhard, V. Shutthanandan, L. Bergman, J. Huso and M. D. McCluskey, J. Appl. Phys. 105, 013715 (2009).
31. 31) S. Herodotou, R. E. Treharne, K. Durose, G. J. Tatlock and R. J. Potter, Materials 8, 7230 (2015).10.3390/ma8105369 ↗
32. 32) T. P. Rao and M. C. Santhosh Kumar, J. Alloy. Compd. 506, 788 (2010).10.1016/j.jallcom.2010.07.071 ↗
33. 33) S.-Y. Kuo, W.-C. Chen, F.-I. Lai, C.-P. Cheng, H.-C. Kuo, S.-C. Wang and W.-F. Hsieh, J. Cryst. Growth 287, 78 (2006).10.1016/j.jcrysgro.2005.10.047 ↗
34. 34) T. Nagata, A. Ashida, N. Fujimura and T. Ito, Jpn. J. Appl. Phys. 41, 6916 (2002).10.1143/JJAP.41.6916 ↗
35. 35) S. Yasuhara, Y. Tomizawa, K. Okamoto, M. Tozuka, A. Nakagawa, S. Yasui, H. Funakubo and T. Hoshina, Jpn. J. Appl. Phys. 64, 08SP02 (2025).10.35848/1347-4065/adefe9 ↗
36. 36) Y. Shimomura, S. Ohno, K. Hayashi and H. Akamatsu, npj Comput. Mater. 11, 38 (2025).10.1038/s41524-025-01519-3 ↗