Study of wet chemical etching of BaSrTiO3 ferroelectric thin films for intelligent antenna application
Source abstract
Abstract
Wet chemical etching of (Ba1−xSrx)TiO3 thin films has been investigated. The etchant was prepared from buffered hydrofluoric acid (BHF) and nitric acid (HNO3), BHF being the reactive agent while HNO3 acts as a catalyst. X-ray diffraction and energy dispersive X-ray spectrometry were performed in order to qualitatively and quantitatively follow the etching process. Scanning electron microscopy and a profilometer were used for determining the etching quality. The ferroelectric thin films were elaborated by a modified sol–gel process and by spin-coating on insulating (Si-wafers) or metal (stainless steel) substrates. Classic photolithography technique and a positive photo resist were used for the transfer of the patterns. Appropriate water dilution reduces the etching speed, thus allowing a better visual control of the process.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Advanced MEMS and NEMS Technologies · Acoustic Wave Resonator Technologies · Ferroelectric and Piezoelectric Materials
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References (18)
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