journal article·2017-05

The crucible/silicon interface in directional solidification of photovoltaic silicon

D. Camel, B. Drevet, V. Brizé, F. Disdier, E. Cierniak, N. Eustathopoulos

Acta Materialia· Volume 129
Publisher page

Abstract

Abstract Photovoltaic silicon ingots are currently grown in silica crucibles coated with a porous silicon nitride layer which acts as an interface releasing agent between the silicon and the crucible. The interactions between Si and the Si 3 N 4 coating determine the infiltration and sticking phenomena occurring at the interface and also affect the pollution of Si by the components of the coating. In this investigation the interfacial interactions and microstructure are studied in crystallization experiments performed in crucibles involving high silicon masses (tens of kg) and long contact time between the silicon and the coated silica (tens of hours). It is shown that for long times, a dramatic change in the nature of the coating/Si interface takes place, with the formation of a self-crucible which prevents the direct contact between the silicon and the coating. The stability of the self-crucible is modeled taking into account the capillary and hydrostatic pressures. The influence of the self-crucible on different practical aspects of the photovoltaic silicon crystallization process is discussed.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Advanced ceramic materials synthesis · Silicon Nanostructures and Photoluminescence · Silicon and Solar Cell Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (24)

Show source-provided references
1. Czochralski process dynamics and control design
2. Rancoule G, Crucible for the crystallisation of silicon and process for making the same, US Patent 8298332B2.
3. Influence of the coating preparation method and of nanosilica addition on the bonding character of Si3N4 layer on silica crucible10.1016/j.ceramint.2013.12.104 ↗
4. Initial stages of silicon–crucible interactions in crystallisation of solar grade silicon: kinetics of coating infiltration10.1016/j.actamat.2014.04.072 ↗
5. Wettability and reactivity of molten silicon with various substrates10.1007/s00339-002-2001-8 ↗
6. Wetting and adhesion of Si on Si3N4 and BN substrates10.1016/j.jeurceramsoc.2009.01.024 ↗
7. Influence of oxidation on the wetting behaviour of liquid silicon on Si3N4-coated substrates10.1016/j.jcrysgro.2010.05.006 ↗
8. Reimann · 2015 · 605
9. Wetting, infiltration and sticking phenomena in Si3N4 releasing coatings in the growth of photovoltaic silicon10.1016/j.solmat.2009.10.020 ↗
10. Thermodynamic analysis of oxygen incorporation from a quartz crucible during solidification of multicrystalline silicon for solar cell10.1016/j.jcrysgro.2008.08.045 ↗
11. Beta-Si3N4 particles as nucleation sites in multicrystalline silicon10.1016/j.actamat.2016.02.066 ↗
12. Nitrogen reaction with silicon: investigation of Si undercooling and Si3N4 growth10.1016/j.jcrysgro.2011.09.036 ↗
13. Undercooling measurement and nucleation study of silicon droplets on various substrates10.1016/j.jcrysgro.2016.07.018 ↗
14. Chemical stability of silicon nitride coatings used in the crystallization of photovoltaic silicon ingots. Part I: stability in vacuum10.1016/j.jeurceramsoc.2016.07.019 ↗
15. Wetting of ceramics by molten silicon and silicon alloys: a review10.1007/s10853-012-6663-0 ↗
16. Silicon nitride and related materials10.1111/j.1151-2916.2000.tb01182.x ↗
17. Formation process of Si3N4 particles on surface of Si ingots grown using silica crucibles with Si3N4 coating by noncontact crucible method10.1016/j.jcrysgro.2013.12.006 ↗
18. 1999 · 486
19. Concentration, solubility and equilibrium distribution coefficient of nitrogen and oxygen in semi conductor silicon10.1149/1.2403610 ↗
20. Densité des principaux métaux et métalloïdes
21. Chemical stability of silicon nitride coatings used in the crystallization of photovoltaic silicon ingots. Part II: stability under argon flow10.1016/j.jeurceramsoc.2016.07.021 ↗
22. Surface tension of liquid silicon: high or low value?10.1016/j.jcrysgro.2013.02.010 ↗
23. Contact angles10.1039/df9480300011 ↗
24. Oxygen and carbon transfer during solidification of semiconductor grade silicon in different process10.1016/S0022-0248(99)00878-7 ↗