journal article·2022-06

Intrinsic 90° charged domain wall and its effects on ferroelectric properties

Pingan Zhou, Binjian Zeng, Wanzhen Yang, Jiajia Liao, Fanqi Meng, Qinghua Zhang, Lin Gu, Shuaizhi Zheng, Min Liao, Yichun Zhou

Acta Materialia· Volume 232
Publisher page

Abstract

The domain is an important characteristic of ferroelectric materials, and the type of domain can have significant effects on the performance of ferroelectric materials. In particular, the unique wake-up and fatigue effects of Hf 0.5Zr 0.5O 2 (HZO) films severely restrict improvements in terms of film performance. Recently, using integrated differential phase contrast (iDPC) scanning transmission electron microscopy (STEM) imaging, we observed the existence of intrinsic tail-to-tail 90° domain structures, charged domain walls (CDWs), and polarization relaxation on the TiN/HZO/TiN interfaces of HZO films. Based on this experimental investigation, we establish a phase-field model of the tail-to-tail 90°CDWs based on the time-dependent Ginzburg–Landau equation. In our model, the tail-to-tail 90°CDW affects the mesoscopic domain switching through a built-in electric field, which, in turn, affects the macroscopic ferroelectric properties of the thin film. The following conclusions are drawn: (a) the CDWs that are distributed horizontally or vertically along the thickness of the film cause a A-wake-up effect (antiferroelectric-like wake-up) with double hysteresis loops or a S-wake-up effect (spindle-like wake-up), with thick portions in the middle and both ends points of the hysteresis loop; (b) the S-wake-up caused by the CDWs distributed along the thickness of the film performs badly in fatigue tests and is easier to break down. The model proposed herein reveals the mechanism of the wake-up effect in hafnium oxide-based ferroelectric films. It provides a theoretical basis for the development of a new type of hafnium oxide-based ferroelectric memory system.
Source: expertdata · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Ferroelectric and Piezoelectric Materials · Advanced Memory and Neural Computing

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (45)

Show source-provided references
1. Effects of anisotropic misfit strains on equilibrium phases and domain structures in (111)-oriented ferroelectric PbTiO3 films10.1016/j.actamat.2021.116639 ↗
2. Continuum thermodynamics of ferroelectric domain evolution: theory, finite element implementation, and application to domain wall pinning10.1016/j.jmps.2006.07.006 ↗
3. Utilizing mechanical loads and flexoelectricity to induce and control complicated evolution of domain patterns in ferroelectric nanofilms10.1016/j.jmps.2015.04.003 ↗
4. Converse flexoelectricity around ferroelectric domain walls10.1016/j.actamat.2020.03.054 ↗
5. Oxygen octahedral coupling mediated ferroelectric-antiferroelectric phase transition based on domain wall engineering10.1016/j.actamat.2020.08.007 ↗
6. Conduction at domain walls in oxide multiferroics10.1038/nmat2373 ↗
7. Effect of grain orientation and grain size on ferroelectric domain switching and evolution: phase field simulations10.1016/j.actamat.2006.09.048 ↗
8. Real-time observation of phase coexistence and a1/a2 to flux-closure domain transformation in ferroelectric films10.1016/j.actamat.2020.04.009 ↗
9. Head-to-head and tail-to-tail 180 domain walls in an isolated ferroelectric10.1103/PhysRevB.83.184104 ↗
10. Conduction through 71 domain walls in BiFeO3 thin films10.1103/PhysRevLett.107.127601 ↗
11. Conductive tail-to-tail domain walls in epitaxial BiFeO3 films10.1063/1.5045721 ↗
12. Free-electron gas at charged domain walls in insulating BaTiO310.1038/ncomms2839 ↗
13. Dynamics and manipulation of ferroelectric domain walls in bismuth ferrite thin films10.1093/nsr/nwz176 ↗
14. The atomic-scale domain wall structure and motion in HfO2-based ferroelectrics: a first-principle study10.1016/j.actamat.2020.07.012 ↗
15. Ferroelectric properties and polarization fatigue of La: HfO2 thin-film capacitors10.1002/pssr.202000481 ↗
16. On the origin of wake-up and antiferroelectric-like behavior in ferroelectric hafnium oxide10.1002/pssr.202170022 ↗
17. Ferroelectricity and antiferroelectricity of doped thin HfO2-based films10.1002/adma.201404531 ↗
18. Scale-free ferroelectricity induced by flat phonon bands in HfO210.1126/science.aba0067 ↗
19. Strain effect on the stability in ferroelectric HfO2 simulated by first-principles calculations10.1088/1361-6463/ab7fd4 ↗
20. The origin of ferroelectricity in Hf1−xZrxO2: a computational investigation and a surface energy model10.1063/1.4916707 ↗
21. Optimized annealing conditions to enhance stability of polarization in sputtered HfZrOx layers for non-volatile memory applications10.1016/j.cap.2020.09.013 ↗
22. Evolution of phases and ferroelectric properties of thin Hf0. 5Zr0. 5O2 films according to the thickness and annealing temperature10.1063/1.4811483 ↗
23. Atomic-scale imaging of polarization switching in an (anti-) ferroelectric memory material: zirconia (ZrO2)
24. Direct comparison of ferroelectric properties in Hf0.5Zr0.5O2 between thermal and plasma-enhanced atomic layer deposition10.1088/1361-6528/aba5b7 ↗
25. Study on the size effect in Hf0. 5Zr0. 5O2 films thinner than 8 nm before and after wake-up field cycling10.1063/1.4935588 ↗
26. Atomic-scale study of electric dipoles near charged and uncharged domain walls in ferroelectric films10.1038/nmat2080 ↗
27. A continuum analysis of charge induced ferroelectric domain wall motions10.1016/j.jmps.2005.08.005 ↗
28. Nonstandard imaging methods in electron microscopy10.1016/S0304-3991(76)91538-2 ↗
29. Phase contrast STEM for thin samples: integrated differential phase contrast10.1016/j.ultramic.2015.10.011 ↗
30. A microscopic theory for antiphase boundary motion and its application to antiphase domain coarsening10.1016/0001-6160(79)90196-2 ↗
31. Domain formation and elastic long-range interaction in ferroelectric perovskites10.1103/PhysRevB.50.5838 ↗
32. Domain switching in polycrystalline ferroelectric ceramics10.1038/nmat1485 ↗
33. Flexoelectricity-induced retention failure in ferroelectric films10.1016/j.actamat.2020.06.037 ↗
34. Phase-field method of phase transitions/domain structures in ferroelectric thin films: a review10.1111/j.1551-2916.2008.02413.x ↗
35. Microscopic crystal phase inspired modeling of Zr concentration effects in Hf1-xZrxO2 thin films
36. Multi-domain negative capacitance effects in metal-ferroelectric-insulator-semiconductor/metal stacks: a phase-field simulation based study10.1038/s41598-020-66313-1 ↗
37. Phase field modeling of domain dynamics and polarization accumulation in ferroelectric HZO10.1063/1.5092707 ↗
38. Thermodynamics of nanodomain formation and breakdown in scanning probe microscopy: landau-ginzburg-devonshire approach10.1103/PhysRevB.80.214110 ↗
39. Microscopic crystal phase inspired modeling of zr concentration effects in Hf1-xZrxO2 thin films
40. Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature
41. Curie temperature and critical thickness of ferroelectric thin films10.1063/1.1861517 ↗
42. Variation caused by spatial distribution of dielectric and ferroelectric grains in a negative capacitance field-effect transistor10.1109/TED.2018.2864971 ↗
43. Experiment and modeling of dynamical hysteresis in thin film ferroelectrics10.35848/1347-4065/ab6d80 ↗
44. Layer thickness scaling and wake-up effect of pyroelectric response in Si-doped HfO210.1063/1.5019308 ↗
45. The effects of oxygen vacancies on ferroelectric phase transition of HfO2-based thin film from first-principle10.1016/j.commatsci.2019.05.041 ↗