journal article·2019-01-10

Oxygen Vacancy as a Medium-Induced Ferromagnetism in (Fe, Sb) Codoped SnO2 Films

Fakai Xue, Xiaocan Liu, Jiwen Liu

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Abstract

(Sn 0.97– x Sb 0.03 Fe x )O 2 films ( x = 0, 0.024, 0.046, and 0.073) were prepared by radio frequency magnetron sputtering. The structural environment, electrical transport, and magnetic behavior of the films were studied by X-ray diffractometer, X-ray photoelectron spectroscopy (XPS), X-ray absorption near-edge structure, physical property measurement system, electron paramagnetic resonance (EPR), and superconducting quantum interference methods. All of the films exhibited the tetragonal rutile structure of SnO 2 by X-ray diffraction. XPS and extended X-ray absorption fine structure measurements revealed that Fe-doping ions substitute for Sn 4+ sites of SnO 2 lattice with a mixed-valence (Fe 2+ /Fe 3+ ) and no trace of Fe cluster or second phases are in the doped system. The electrical transport measurement showed that the films have a typical semiconductor characteristic and that the carrier concentration n c decreases monotonically with Fe-doped concentration, and the carriers are strongly localized. Magnetic measurement showed that the saturation magnetization of the films increases regularly with Fe-doped concentration at room temperature. On the basis of EPR analysis, with an increase of Fe-doped concentration, the number of oxygen vacancies (V o + ) increases. The oxygen vacancies result in a long-range ferromagnetic ordering of the codoped SnO 2 films. The origin of ferromagnetism of the codoped SnO 2 films can be attributed to bound magnetic polaron mechanism.
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Research context

OpenAlex topics: ZnO doping and properties · Gas Sensing Nanomaterials and Sensors · Transition Metal Oxide Nanomaterials

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Affiliations

Key Laboratory of Display Materials and Photoelectric Devices, Ministry of Education; Tianjin Key Laboratory for Photoelectric Materials and Devices; School of Materials Science and Engineering, Tianjin University of Technology, Tianjin 300384, China

Funding

National Natural Science Foundation of China

References (32)

Show source-provided references
1. 10.1016/j.physleta.2010.05.00310.1016/j.physleta.2010.05.003 ↗
2. 10.1021/jp312080v10.1021/jp312080v ↗
3. 10.1007/s10854-005-3232-110.1007/s10854-005-3232-1 ↗
4. 10.1016/j.matlet.2014.09.08210.1016/j.matlet.2014.09.082 ↗
5. 10.1103/physrevlett.91.07720510.1103/physrevlett.91.077205 ↗
6. 10.1021/cm401824810.1021/cm4018248 ↗
7. 10.1016/j.snb.2010.06.05710.1016/j.snb.2010.06.057 ↗
8. 10.1016/j.matchemphys.2016.04.02010.1016/j.matchemphys.2016.04.020 ↗
9. 10.1016/j.jmmm.2010.12.01810.1016/j.jmmm.2010.12.018 ↗
10. 10.1016/j.snb.2007.07.10810.1016/j.snb.2007.07.108 ↗
11. 10.1063/1.330246810.1063/1.3302468 ↗
12. 10.1016/j.physb.2009.06.09910.1016/j.physb.2009.06.099 ↗
13. 10.1063/1.475445410.1063/1.4754454 ↗
14. 10.1039/c3ra46325g10.1039/c3ra46325g ↗
15. 10.1021/jp201741m10.1021/jp201741m ↗
16. Mariammal R. N. · J. Nano- Electron. Phys. · 2011 · 3 · 92
17. 10.1007/s10948-016-3879-210.1007/s10948-016-3879-2 ↗
18. 10.1007/s00339-016-0519-410.1007/s00339-016-0519-4 ↗
19. 10.1063/1.305637410.1063/1.3056374 ↗
20. 10.1088/1742-6596/817/1/01203110.1088/1742-6596/817/1/012031 ↗
21. 10.1116/1.57990110.1116/1.579901 ↗
22. 10.1016/j.cej.2017.01.10510.1016/j.cej.2017.01.105 ↗
23. 10.1063/1.365045810.1063/1.3650458 ↗
24. 10.1016/j.jallcom.2015.03.18410.1016/j.jallcom.2015.03.184 ↗
25. 10.1039/c4tc01070a10.1039/c4tc01070a ↗
26. 10.1016/j.jmmm.2014.03.03110.1016/j.jmmm.2014.03.031 ↗
27. 10.1021/acs.jpcc.6b0948010.1021/acs.jpcc.6b09480 ↗
28. Mott N. F. · 1979
29. 10.1016/j.physe.2014.08.01610.1016/j.physe.2014.08.016 ↗
30. 10.1007/s10948-013-2313-210.1007/s10948-013-2313-2 ↗
31. 10.1063/1.165004110.1063/1.1650041 ↗
32. 10.1016/j.apsusc.2014.12.18210.1016/j.apsusc.2014.12.182 ↗