journal article·1989-12

Meta-stable changes in the output characteristics of high-voltage amorphous silicon thin-film transistors

John G. Shaw, Mike Hack, Russel A. Martin

Journal of Non-Crystalline Solids· Volume 115· Issue 1-3
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Advancements in Semiconductor Devices and Circuit Design · Semiconductor materials and devices

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References (6)

Show source-provided references
1. Tuan · 1986 · 70 · 651
2. Hack · 1987 · 95 · 457
3. Martin · IEDM · 1987 · 87 · 440
4. Degradation of high and low voltage amorphous silicon thin-film transistors due to air leak
5. Shaw · J. Appl. Phys. · 1988 · 65 · 456210.1063/1.341258 ↗
6. Shaw · J. Appl. Phys. · 1989