journal article·1995-07

Plasma-enhanced silicon nitride deposition for thin film transistor applications

L.J. Quinn, S.J.N. Mitchell, B.M. Armstrong, H.S. Gamble

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and devices · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (12)

Show source-provided references
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2. Schomer · IEEE Trans. Electron Dev. ED-28 · 1981 · 1466
3. Sinha · J. Electrochem. Soc. · 1978 · 125 · 60110.1149/1.2131509 ↗
4. Mar · IEEE Trans. Electron Dev. ED-24 · 1977 · S40
5. Mumumura · IEEE Trans. Electron Dev. ED-36 · 1989 · 35110.1109/16.19936 ↗
6. Kobayashi · Jpn. J. Appl. Phys. · 1992 · 31 · 33610.1143/JJAP.31.336 ↗
7. Quinn · 1993
8. Dun · J. Elechochem. Soc. · 1981 · 128 · 155510.1149/1.2127682 ↗
9. Land · J. Appl. Phys. · 1978 · 49 · 247310.1063/1.324589 ↗
10. Claassen · J. Electrochem. Soc. · 1985 · 132 · 89310.1149/1.2113980 ↗
11. Quinn · 1994 · 2 · 599
12. Quinn · 1994 · Vol. 24 · 581