journal article·1989-12

Low voltage operation a-Si:H thin film transistors with very thin PECVD a-SiO2 gate dielectric

Guglielmo Fortunato, Luigi Mariucci, Carlo Reita, Piero Foglietti

Journal of Non-Crystalline Solids· Volume 115· Issue 1-3
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and devices · Silicon Nanostructures and Photoluminescence

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References (5)

Show source-provided references
1. Thompson · J. Vac. Sci. Technol. · 1984 · B2 · 82710.1116/1.582902 ↗
2. Batey · J. Appl. Phys. · 1986 · 60 · 313610.1063/1.337726 ↗
3. Dresner · J. Vac. Sci. Technol. · 1988 · B6 · 51710.1116/1.584062 ↗
4. L. Mariucci et. al., this volume.
5. Pai · J. Vac. Sci. Technol. · 1986 · A4 · 68910.1116/1.573833 ↗