journal article·1996-05

The isochronal annealing study on the bias stressed amorphous silicon thin film transistors

Chi-Sun Hwang, Byung Seong Bae, Choochon Lee

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Thin-Film Transistor Technologies · Surface Roughness and Optical Measurements · Silicon Nanostructures and Photoluminescence

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References (10)

Show source-provided references
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7. Macdonald · J. Appl. Phys. · 1987 · 62 · R5110.1063/1.339013 ↗
8. Jackson · Phys. Rev. · 1989 · B39 · 116410.1103/PhysRevB.39.1164 ↗
9. Powell · Appl. Phys. Lett. · 1987 · 51 · 124210.1063/1.98692 ↗
10. Powell · Phys. Rev. · 1992 · B45 · 416010.1103/PhysRevB.45.4160 ↗