journal article·2011-11

Xerographic spectroscopy of gap states in Se-rich amorphous semiconductors review

V.I. Mikla, V.V. Mikla

Journal of Non-Crystalline Solids· Volume 357· Issue 22-23
Publisher page

Abstract

Abstract One of the most important parameters which determine the performance of many modern devices based on amorphous semiconductors is the drift mobility-lifetime product, μτ . There has been much interest in determination of charge-carrier ranges in amorphous semiconductors by various measurement techniques. Although the mobility, μ, can be measured by the conventional time-of-flight transient photoconductivity technique, the determination of the lifetime, τ, is often complicated by both experimental and theoretical limitations. The present article provides an overview of xerographic measurements as a tool for studying the electrical properties of amorphous semiconductors. First, details of the experimental set-up are discussed. Thereafter, the analysis and interpretation of dark discharge, the first cycle residual potential, cycled-up saturated residual potential are considered. It is shown that from such measurements the charge-carrier lifetime, τ , the range of the carriers, μτ , and the integrated concentration of deep traps in the mobility gap can be readily and accurately determined. Xerographic measurements on Se-rich amorphous photoconductors have indicated the presence of relatively narrow distribution of deep hole traps with integrated density of about 10 13 cm − 3 . These states are located at ~ 0.85 eV from the valence band. A good correlation was observed between residual potential and the hole range, in agreement with the simple Warter expression. The capture radius is estimated to be r c = 2–3 A. Since r c for pure a-Se and a-As x Se 1 − x is comparable to the Se–Se interatomic bond length in a-Se, it can be suggested that deep hole trapping centers in these chalcogenide semiconductors are neutral-looking defects, possibly of intimate valence-alternation pair (IVAP) in nature. The absence of any electron spin resonance signal (ESR) at room temperature seemed to be a strong argument in favor of this suggestion. Finally, photoinduced effects on xerographic parameters are discussed. It has been shown that photoexcitation of a-As x Se 1 − x amorphous films with band-gap light alters deep hole and electron states. During room-temperature annealing photosensitized states relax to equilibrium. Recovery process becomes slower with increasing As content. Qualitative explanation of the observed behavior may be based on associating the deep states with C 3 + and C 1 − intimate-valence-alternation–pair (IVAP) centers.
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Research context

OpenAlex topics: Phase-change materials and chalcogenides · Thin-Film Transistor Technologies · Chalcogenide Semiconductor Thin Films

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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