Characteristics of heteroepitaxial Cu2−Mn O/Nb–SrTiO3 p–n junction
Source abstract
Abstract
Abstract Mn-doped cuprous oxide Cu2−xMnxO (CMO), where x = 0.03, is a p-type diluted magnetic semiconductor (DMS) with Curie temperature above room temperature [M. Wei, N. Braddon, et al., Appl. Phys. Lett. 86 (2005) 0725141; Y.L. Liu, S. Harrington, et al., Appl. Phys. Lett. 87 (2005) 222108]. We have grown CMO (x = 0.03) thin films of about 200 nm thick on n-type semiconducting (0 0 1)Nb–SrTiO3(NSTO) single crystal substrates by pulsed laser deposition. Cubic crystalline phases of CMO layers were obtained in a narrow deposition pressure window of about 20 mTorr at growth temperature of 650 °C. X-ray diffraction and TEM studies of these heterostructures reveal a cube-on-cube epitaxial relationship of [CMO]001/[NSTO]001. All the oxide p–n junctions with the size of 500 × 500 μm were fabricated by the shadow masking technique. These junctions show highly asymmetric I–V characteristics. The rectification ratio at room temperature is about 103 at ±2 V. Leakage current density of 10−4 A cm−2 at −1 V is observed. No apparent junction breakdown is recorded at reverse bias voltages down to −5 V. From the 1/C2–V plots, the forward bias turn on voltage is ∼1.4 V. Clear junction current rectifying property is maintained at up to 200 °C. Our results have demonstrated that epitaxial CMO films can be fabricated on lattice matched cubic substrates. They are suitable DMS for above room temperature spintronic junction applications.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: ZnO doping and properties · Copper-based nanomaterials and applications · Electronic and Structural Properties of Oxides
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References (20)
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1. Wei · Appl. Phys. Lett. · 2005 · 86 · 07251410.1063/1.1869547 ↗
2. Liu · Appl. Phys. Lett. · 2005 · 87 · 22210810.1063/1.2136349 ↗
3. Sugiura · Jpn. J. Appl. Phys. · 1999 · 38 · 267510.1143/JJAP.38.2675 ↗
4. Zhang · Appl. Phys. Lett. · 2002 · 80 · 437810.1063/1.1485120 ↗
5. Ohta · Appl. Phys. Lett. · 2003 · 83 · 102910.1063/1.1598624 ↗
6. Sun · Appl. Phys. Lett. · 2004 · 84 · 261110.1063/1.1702128 ↗
7. Dietl · Science · 2000 · 287 · 101910.1126/science.287.5455.1019 ↗
8. Dietl · Phys. Rev. B · 2001 · 63 · 19520510.1103/PhysRevB.63.195205 ↗
9. Kale · Appl. Phys. Lett. · 2003 · 82 · 210010.1063/1.1564864 ↗
10. Rode · J. Appl. Phys. · 2003 · 93 · 767610.1063/1.1556115 ↗
11. Matsumoto · Jpn J. Appl. Phys. · 2001 · 40 · L120410.1143/JJAP.40.L1204 ↗
12. Ogale · Phys. Rev. Lett. · 2003 · 91 · 07720510.1103/PhysRevLett.91.077205 ↗
13. Norton · Electrochem. Solid State Lett. · 2003 · 6 · G3110.1149/1.1531871 ↗
14. Igor · Phys. Rev. B. · 2001 · 64 · 12120110.1103/PhysRevB.64.121201 ↗
15. Golden · Chem. Mater. · 1996 · 8 · 249910.1021/cm9602095 ↗
16. Pollack · J. Appl. Phys. · 1975 · 46 · 16310.1063/1.321312 ↗
17. Robertson · Phys. Rev. B · 1983 · 28 · 337810.1103/PhysRevB.28.3378 ↗
18. Petroff · Phys. Rev. B · 1975 · 12 · 248810.1103/PhysRevB.12.2488 ↗
19. Feldman · Phys. Rev. · 1943 · 64 · 11310.1103/PhysRev.64.113 ↗
20. Rakhshani · J. Appl. Phys. · 1991 · 69 · 229010.1063/1.348709 ↗