Amorphous hydrogenated silicon–carbon as new antireflective coating for solar cells

Abstract The authors used plasma enhanced chemical vapor deposition (RF) in SiH 4 + CH 2 to deposit hydrogenated amorphous silicon–carbon (a-Si:C:H) films. The process parameters were chosen to obtain films of optimal energy gap, refractive index (depended on carbon content) and thickness suitable for optoelectronic applications. The correlation between thin film morphology, structure and process parameters was found. The films were chemically inert and wear resistive. For some process parameters it was possible to obtain films of low reflectivity, smooth, hydrogen rich and homogeneous. Multicrystalline silicon solar cells with a-Si:C:H coating on a front surface exhibit apparent increase in efficiency. a-Si:C:H thin films seems to be good candidates for antireflective coatings (ARC) in solar cells.