Real-time and online screening method for materials emitting volatile organic compounds
Source abstract
Abstract
In the semiconductor industry, volatile organic compounds (VOCs) in the cleanroom air work as airborne molecular contamination, which reduce the production yield of semiconductor chips by forming nanoparticles and haze on silicon wafers and photomasks under ultraviolet irradiation during photolithography processes. Even though VOCs in outdoor air are removed by gas filters, VOCs can be emitted from many kinds of materials used in cleanrooms, such as organic solvents and construction materials (e.g., adhesives, flame retardants and sealants), threatening the production of semiconductors. Therefore, finding new replacements that emit lower VOCs is now essential in the semiconductor industry. In this study, we developed a real-time and online method to screen materials for developing the replacements by converting VOCs into nanoparticles under soft X-ray irradiation. This screening method was applied to measure VOCs emitted from different kinds of organic solvents and adhesives. Our results showed good repeatability and high sensitivity for VOCs, which come from aromatic compounds, some alcohols and all tested adhesives (Super glue and cleanroom-use adhesives). In addition, the overall trend of measured VOCs from cleanroom-use adhesives was well matched with those measured by a commercial thermal desorption–gas chromatography–mass spectrometry, which is a widely used off-line method for analyzing VOCs. Based on the results, this screening method can help accelerate the developing process for reducing VOCs in cleanrooms.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Advanced Chemical Sensor Technologies · Gas Sensing Nanomaterials and Sensors · Indoor Air Quality and Microbial Exposure
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (28)
Show source-provided references
1. Atkinson R (2000) Atmospheric chemistry of VOCs and NO(x). Atmos Environ 34:2063–2101. doi: 10.1016/S1352-2310(99)00460-410.1016/S1352-2310(99)00460-4 ↗
2. Bansal RC, Goyal M (2005) Activated carbon adsorption. CRC Press, Boca Raton10.1201/9781420028812 ↗
3. Barro R, Regueiro J, Llompart M, Garcia-Jares C (2009) Analysis of industrial contaminants in indoor air: part 1. Volatile organic compounds, carbonyl compounds, polycyclic aromatic hydrocarbons and polychlorinated biphenyls. J Chromatogr A 1216:540–566. doi: 10.1016/j.chroma.2008.10.11710.1016/j.chroma.2008.10.117 ↗
4. Billet S, Abbas I, Goff J Le, Verdin A, André V, Lafargue PE, Hachimi A, Cazier F, Sichel F, Shirali P, Garçon G (2008) Genotoxic potential of polycyclic aromatic hydrocarbons-coated onto airborne particulate matter (PM2.5) in human lung epithelial A549 cells. Cancer Lett 270:144–155. doi: 10.1016/j.canlet.2008.04.04410.1016/j.canlet.2008.04.044 ↗
5. Blake RS, Monks PS, Ellis AM (2009) Proton-transfer reaction mass spectrometry. Chem Rev 109:861–896. doi: 10.1021/cr800364q10.1021/cr800364q ↗
6. Chen JP, Wu S, Chong K-H (2003) Surface modification of a granular activated carbon by citric acid for enhancement of copper adsorption. Carbon 41:1979–198610.1016/S0008-6223(03)00197-0 ↗
7. Chingombe P, Saha B, Wakeman RJ (2005) Surface modification and characterisation of a coal-based activated carbon. Carbon 43:3132–3143. doi: 10.1016/j.carbon.2005.06.02110.1016/j.carbon.2005.06.021 ↗
8. Christensen PS, Wedel S, Livbjerg H (1994) The kinetics of the photolytic production of aerosols from SO2 and NH3 in humid air. Chem Eng Sci. doi: 10.1016/S0009-2509(05)80044-210.1016/S0009-2509(05)80044-2 ↗
9. Dallas AJ, Graham K, Clarysse M, Fonderle V (2002) Characterization and control of organic airborne contamination in lithographic processing. In: Herr DJC (ed) SPIE, Santa Clara, pp 1085–1109. doi:10.1117/12.47343810.1117/12.473438 ↗
10. Den W, Bai H, Kang Y (2006) Organic airborne molecular contamination in semiconductor fabrication clean rooms. J Electrochem Soc. doi: 10.1149/1.214728610.1149/1.2147286 ↗
11. Donovan RP (1990) Particle control for semiconductor manufacturing. M. Dekker, New York
12. Hakim M, Broza YY, Barash O, Peled N, Phillips M, Amann A, Haick H (2012) Volatile organic compounds of lung cancer and possible biochemical pathways. Chem Rev 112:5949–5966. doi: 10.1021/cr300174a10.1021/cr300174a ↗
13. Jiang J, Chen M, Kuang C, Attoui M, McMurry PH (2011) Electrical mobility spectrometer using a diethylene glycol condensation particle counter for measurement of aerosol size distributions down to 1 nm. Aerosol Sci Technol 45:510–521. doi: 10.1080/02786826.2010.54753810.1080/02786826.2010.547538 ↗
14. Kang Y, Den W, Bai H, Ko F-H (2005) Direct quantitative analysis of phthalate esters as micro-contaminants in cleanroom air and wafer surfaces by auto-thermal desorption–gas chromatography–mass spectrometry. J Chromatogr A 1070:137–145. doi: 10.1016/j.chroma.2005.02.05510.1016/j.chroma.2005.02.055 ↗
15. Keywood MD, Varutbangkul V, Bahreini R, Flagan RC, Seinfeld JH (2004) Secondary organic aerosol formation from the ozonolysis of cycloalkenes and related compounds. Environ Sci Technol 38:4157–4164. doi: 10.1021/es035363o10.1021/es035363o ↗
16. Kim C, Pui DYH (2015) Experimental study on the filtration efficiency of activated carbons for 3–30 nm particles. Carbon 93:226–229. doi: 10.1016/j.carbon.2015.05.04810.1016/j.carbon.2015.05.048 ↗
17. Kim SC, Harrington MS, Pui DYH (2007) Experimental study of nanoparticles penetration through commercial filter media. J Nanoparticle Res 9:117–125. doi: 10.1007/s11051-006-9176-410.1007/s11051-006-9176-4 ↗
18. Kim C, Zuo Z, Finger H, Haep S, Asbach C, Fissan H, Pui DYH (2015) Soft X-ray-assisted detection method for airborne molecular contaminations (AMCs). J Nanoparticle Res 17:126. doi: 10.1007/s11051-015-2936-210.1007/s11051-015-2936-2 ↗
19. Kim C, Kang S, Pui DY (2016) Removal of airborne sub-3 nm particles using fibrous filters and granular activated carbons. Carbon 104:125–13210.1016/j.carbon.2016.03.060 ↗
20. Licciardello A, Puglisi O, Pignataro S (1986) Effect of organic contaminants on the oxidation kinetics of silicon at room temperature. Appl Phys Lett 48:41. doi: 10.1063/1.9675510.1063/1.96755 ↗
21. Lobert JM, Cate PW, Ruede DJ, Wildgoose JR, Miller CM, Gaudreau JC (2010) Advances in the understanding of low molecular weight silicon formation and implications for control by AMC filters. In: Raymond CJ (ed) SPIE, San Jose, pp 763832. doi:10.1117/12.84839010.1117/12.848390 ↗
22. McMurry P (2000) A review of atmospheric aerosol measurements. Atmos Environ 34:1959–1999. doi: 10.1016/S1352-2310(99)00455-010.1016/S1352-2310(99)00455-0 ↗
23. Pitts JN, Grosjean D, Van Cauwenberghe K, Schmid JP, Fitz DR (1978) Photooxidation of aliphatic amines under simulated atmospheric conditions: formation of nitrosamines, nitramines, amides, and photochemical oxidant. Environ Sci Technol 12:946–953. doi: 10.1021/es60144a00910.1021/es60144a009 ↗
24. Sato K, Hatakeyama S, Imamura T (2007) Secondary organic aerosol formation during the photooxidation of toluene: Nox dependence of chemical composition. J Phys Chem A 111:9796–9808. doi: 10.1021/jp071419f10.1021/jp071419f ↗
25. Schueler BW (1992) Microscope imaging by time-of-flight secondary ion mass spectrometry. Microsc Microanal Microstruct 3:119–139. doi: 10.1051/mmm:0199200302-301190010.1051/mmm:0199200302-3011900 ↗
26. Sematech International (2011) International technology road-map for semiconductors (ITRS). Sematech International, Albany, New York
27. Veillerot M, Danel A, Cetre S, Tardif F (2003) Deposition kinetic of airborne organic contamination on wafers measured by TD-GC/MS. Mater Sci Eng B 102:385–389. doi: 10.1016/S0921-5107(02)00628-110.1016/S0921-5107(02)00628-1 ↗
28. Weineck G, Zastera D, Dallas AJ (2010) AMC control in photolithography: the past decade in review. In: Raymond CJ (ed) SPIE proceedings. SPIE, San Jose, pp 1–910.1117/12.847258 ↗