article·2019-10-17Open access

Structural studies of epitaxial BaTiO3 thin film on silicon

Baba Wagué, Jean‐Blaise Brubach, Gang Niu, Guifang Dong, Liyan Dai, P. Roy, G. Saint-Girons, P. Rojo-Romeo, Y. Robach, Bertrand Vilquin

Abstract

Keywords: Ferroelectricity Thin films Silicon Epitaxy Radio-frequency magnetron sputtering Infrared spectroscopy Phonon A B S T R A C T BaTiO 3 thin films (60 nm-thick) grown on SrTiO 3 /Si templates have been characterized for their structural and electrical properties. The epitaxy of the BaTiO 3 film on silicon was confirmed by X-ray diffraction with good crystallinity. The temperature-dependent structural properties were checked by infrared spectroscopy in absorption mode. The films were found to remain in a single ferroelectric phase over a temperature range from 5 to 385 K. Low-temperature orthorhombic-rhombohedral phase transitions characteristic of bulk BaTiO 3 are absent in the films due to the clamping effect from the Si substrate.
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Research context

OpenAlex topics: Ferroelectric and Piezoelectric Materials · Semiconductor materials and devices · Electronic and Structural Properties of Oxides

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