article·2009-10-29

Comprehensive studies on the stabilities of a-In-Ga-Zn-O based thin film transistor by constant current stress

Kenji Nomura, Toshio Kamiya, Y. Kikuchi, Masahiro Hirano, Hideo Hosono

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Abstract

Stability under constant current stress, along with hysteresis characteristics, was studied for a-In-Ga-Zn-O thin-film transistors (TFTs) in several atmospheres and at several temperatures. Unannealed TFTs showed rather large instability; i.e., large hysteresis in transfer curves (ΔV G > 0.8 V) and large positive threshold voltage shift (ΔV th > 10 V for 50 h tests at 5 μA) with deterioration of subthreshold voltage swing was observed. The instability for the unannealed TFT had a strong dependence on the stress atmosphere and the stress temperature, which suggests that trap states generated by the stress test is related to oxygen vacancy formed by breaking weak chemical bonds. Wet annealing improved stability; the hysteresis disappeared and the ΔV th was reduced to <2 V. The improvement is considered to be related to the reduction of weak chemical bonds by wet annealing with the strong oxidation power of water molecules.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Thin-Film Transistor Technologies · ZnO doping and properties · Transition Metal Oxide Nanomaterials

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