article·2001-02-01

Low temperature poly-Si TFT-LCD by excimer laser anneal

Shuichi Uchikoga, Nobuki Ibaraki

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Abstract

Excimer laser anneal (ELA) has allowed the production of large-area poly-Si thin-film transistor liquid crystal displays (TFT-LCDs) on a glass substrate. The state of the art of large-area low-temperature TFT-LCDs is reported in this paper. High-performance poly-Si TFTs are expected to achieve various applications such as system-on-glass where various functions are added on to the display. Possible applications and future trends are discussed together with the technologies required to achieve this goal.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Advanced Optical Imaging Technologies

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