article·2008-11-09

Structural, optical, and electrical properties of tin sulfide thin films grown by spray pyrolysis

M. Calixto-Rodríguez, H. Martı́nez, A. Sánchez-Juárez, J. Campos‐Álvarez, A. Tiburcio-Silver, M. E. Calixto

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Abstract

Abstract Tin sulfide (SnS) thin films have been prepared by spray pyrolysis (SP) technique using tin chloride and N, N-dimethylthiourea as precursor compounds. Thin films prepared at different temperatures have been characterized using several techniques. X-ray diffraction studies have shown that substrate temperature ( T s ) affects the crystalline structure of the deposited material as well as the optoelectronic properties. The calculated optical band gap ( E g ) value for films deposited at T s = 320–396 °C was 1.70 eV (SnS). Additional phases of SnS 2 at 455 °C and SnO 2 at 488 °C were formed. The measured electrical resistivity value for SnS films was ∼ 1 × 10 4 Ω-cm.
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Research context

OpenAlex topics: Chalcogenide Semiconductor Thin Films · Quantum Dots Synthesis And Properties · Semiconductor materials and interfaces

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