journal article·2021-01-26Open access

Time-Dependent Screening Explains the Ultrafast Excitonic Signal Rise in 2D Semiconductors

Valerie Smejkal, Florian Libisch, Alejandro Molina-Sanchez, Chiara Trovatello, Ludger Wirtz, Andrea Marini

ACS Nano· Volume 15· Issue 1

Abstract

We calculate the time evolution of the transient reflection signal in an MoS2 monolayer on a SiO2/Si substrate using first-principles out-of-equilibrium real-time methods. Our simulations provide a simple and intuitive physical picture for the delayed, yet ultrafast, evolution of the signal whose rise time depends on the excess energy of the pump laser: at laser energies above the A- and B-exciton, the pump pulse excites electrons and holes far away from the K valleys in the first Brillouin zone. Electron–phonon and hole–phonon scattering lead to a gradual relaxation of the carriers toward small Active Excitonic Regions around K, enhancing the dielectric screening. The accompanying time-dependent band gap renormalization dominates over Pauli blocking and the excitonic binding energy renormalization. This explains the delayed buildup of the transient reflection signal of the probe pulse, in excellent agreement with recent experimental data. Our results show that the observed delay is not a unique signature of an exciton formation process but rather caused by coordinated carrier dynamics and its influence on the screening.
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Research context

OpenAlex topics: 2D Materials and Applications · Perovskite Materials and Applications · Advanced Memory and Neural Computing

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Vienna University of Technology, Institute for Theoretical Physics, 1040 Vienna, Austria

Institute of Materials Science (ICMUV), University of Valencia, 46071 Valencia, Spain

Department of Physics, Politecnico di Milano, P. Leonardo da Vinci 32, 20133 Milan, Italy

Department of Physics and Materials Science, University of Luxembourg, 1511 Luxembourg, Luxembourg

CNR-ISM, Division of Ultrafast Processes in Materials (FLASHit), Area della Ricerca di Roma 1, Via Salaria Km 29.3, I-00016 Monterotondo, Scalo, Italy

Funding

Ministerio de Econom?a y Competitividad · Technische Universit?t Wien · International Max Planck Research School for Advanced Methods in Process and Systems Engineering · H2020 Research Infrastructures · Fond National de Recherche, Luxembourg

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