Unveiling Three-Dimensional Stacking Sequences of 1T Phase MoS2 Monolayers by Electron Diffraction
Source abstract
Abstract
The phase transition between semiconducting 1H to metallic 1T phases in monolayered transition metal dichalcogenides (TMDs) essentially involves three-dimensional (3D) structure changes of asymmetric relocations of S atoms at the top and bottom of the one-unit-cell crystals. Even though the phase transition has a profound influence on properties and applications of 2D TMDs, a viable approach to experimentally characterize the stacking sequences of the vertically asymmetrical 1T phase is still not available. Here, we report an electron diffraction method based on dynamic electron scattering to characterize the stacking sequences of 1T MoS 2 monolayers. This study provides an approach to unveil the 3D structure of 2D crystals and to explore the underlying mechanisms of semiconductor-to-metal transition of monolayer TMDs.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: 2D Materials and Applications · Graphene research and applications · MXene and MAX Phase Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Mechanical and Aerospace Engineering, School of Engineering, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong SAR
CREST, JST, 4-1-8 Honcho Kawaguchi, Saitama 332-0012, Japan
Funding
Research Grants Council, University Grants Committee · Ministry of Education, Culture, Sports, Science, and Technology · Core Research for Evolutional Science and Technology · Japan Society for the Promotion of Science
References (53)
Show source-provided references
1. 10.1038/ncomms667810.1038/ncomms6678 ↗
2. 10.1021/acsnano.5b0555610.1021/acsnano.5b05556 ↗
3. 10.1038/nnano.2015.34010.1038/nnano.2015.340 ↗
4. 10.1038/nnano.2014.20710.1038/nnano.2014.207 ↗
5. 10.1038/nphoton.2014.27110.1038/nphoton.2014.271 ↗
6. 10.1038/522274a10.1038/522274a ↗
7. 10.1038/nmat409110.1038/nmat4091 ↗
8. 10.1002/anie.20140266210.1002/anie.201402662 ↗
9. 10.1126/science.aab409710.1126/science.aab4097 ↗
10. 10.1002/adma.20150507010.1002/adma.201505070 ↗
11. 10.1002/adma.20140380810.1002/adma.201403808 ↗
12. 10.1021/nn302422x10.1021/nn302422x ↗
13. 10.1038/nmat408010.1038/nmat4080 ↗
14. 10.1021/nl201874w10.1021/nl201874w ↗
15. 10.1038/nnano.2014.6410.1038/nnano.2014.64 ↗
16. 10.1039/C5CS00151J10.1039/C5CS00151J ↗
17. 10.1021/acs.nanolett.6b0118610.1021/acs.nanolett.6b01186 ↗
18. 10.1126/science.aab317510.1126/science.aab3175 ↗
19. 10.1021/nn506469v10.1021/nn506469v ↗
20. 10.1038/nmat367310.1038/nmat3673 ↗
21. 10.1021/nl202228810.1021/nl2022288 ↗
22. 10.1021/nl400747910.1021/nl4007479 ↗
23. 10.1038/ncomms773610.1038/ncomms7736 ↗
24. 10.1002/adma.20150023110.1002/adma.201500231 ↗
25. 10.1038/ncomms729310.1038/ncomms7293 ↗
26. 10.1038/nmat363310.1038/nmat3633 ↗
27. 10.1038/ncomms586710.1038/ncomms5867 ↗
28. 10.1038/ncomms1042610.1038/ncomms10426 ↗
29. 10.1016/j.crhy.2013.09.01510.1016/j.crhy.2013.09.015 ↗
30. 10.1016/j.ultramic.2013.11.00110.1016/j.ultramic.2013.11.001 ↗
31. 10.1038/nature0974110.1038/nature09741 ↗
32. 10.1016/j.ultramic.2013.05.00310.1016/j.ultramic.2013.05.003 ↗
33. 10.1021/nn503211t10.1021/nn503211t ↗
34. Wang, Z. L.Elastic and Inelastic Scattering in Electron Diffraction and Imaging;Springer:Boston, MA, 1995; pp23–94.10.1007/978-1-4899-1579-5_2 ↗
35. 10.1038/srep2153610.1038/srep21536 ↗
36. 10.1002/adma.20130149210.1002/adma.201301492 ↗
37. 10.1021/acs.nanolett.5b0280510.1021/acs.nanolett.5b02805 ↗
38. 10.1002/smll.20110265410.1002/smll.201102654 ↗
39. 10.1021/nl401938t10.1021/nl401938t ↗
40. 10.1021/nl500515q10.1021/nl500515q ↗
41. 10.1021/nl302635710.1021/nl3026357 ↗
42. 10.1021/nn403454e10.1021/nn403454e ↗
43. 10.1021/nn405194e10.1021/nn405194e ↗
44. 10.1021/nl502961e10.1021/nl502961e ↗
45. 10.1002/adom.20130042810.1002/adom.201300428 ↗
46. 10.1021/nn405719x10.1021/nn405719x ↗
47. 10.1021/nn502081910.1021/nn5020819 ↗
48. 10.1021/acsnano.5b0148010.1021/acsnano.5b01480 ↗
49. 10.1021/acsnano.5b0041010.1021/acsnano.5b00410 ↗
50. 10.1021/acsnano.5b0625410.1021/acsnano.5b06254 ↗
51. 10.1016/0304-3991(87)90080-510.1016/0304-3991(87)90080-5 ↗
52. Kirkland, E. J.Advanced Computing in Electron Microscopy;Springer:Boston, MA, 2010; pp77–112.10.1007/978-1-4419-6533-2_5 ↗
53. 10.1016/j.ultramic.2015.04.01610.1016/j.ultramic.2015.04.016 ↗