Area-Selective Lift-Off Mechanism Based on Dual-Triggered Interfacial Adhesion Switching: Highly Facile Fabrication of Flexible Nanomesh Electrode

With the recent emergence of flexible and wearable optoelectronic devices, the achievement of sufficient bendability and stretchability of transparent and conducting electrodes (TCEs) has become an important requirement. Although metal-mesh-based structures have been investigated for TCEs because of their excellent performances, the fabrication of mesh or grid structures with a submicron line width is still complex due to the requirements of laborious lithography and pattern transfer steps. Here, we introduce an extremely facile fabrication technique for metal patterns embedded in a flexible substrate based on submicron replication and an area-selective delamination (ASD) pattern. The high-yield, area-specific lift-off process is based on the principle of solvent-assisted delamination of deposited metal thin films and a mechanical triggering effect by soft wiping or ultrasonication. Our fabrication process is very simple, convenient, and cost-effective in that it does not require any lithography/etching steps or sophisticated facilities. Moreover, their outstanding optical and electrical properties ( e.g., sheet resistances of 0.43 Ω sq –1 at 94% transmittance), which are markedly superior to those of other flexible TCEs, are demonstrated. Furthermore, there is no significant change of resistance over 1000 repeated bending cycles, with a bending radius of 5 mm, and immersion in various solvents such as salt water and organic solvents. Finally, we demonstrate high-performance transparent heaters and flexible touch panels fabricated using the nanomesh electrode, confirming the long-range electrical conduction and reliability of the electrode.