Experimental Study of the Detection Limit in Dual-Gate Biosensors Using Ultrathin Silicon Transistors
Source abstract
Abstract
Dual-gate field-effect biosensors (bioFETs) with asymmetric gate capacitances were shown to surpass the Nernst limit of 59 mV/pH. However, previous studies have conflicting findings on the effect of the capacitive amplification scheme on the sensor detection limit, which is inversely proportional to the signal-to-noise ratio (SNR). Here, we present a systematic experimental investigation of the SNR using ultrathin silicon transistors. Our sensors operate at low voltage and feature asymmetric front and back oxide capacitances with asymmetry factors of 1.4 and 2.3. We demonstrate that in the dual-gate configuration, the response of our bioFETs to the pH change increases proportional to the asymmetry factor and indeed exceeds the Nernst limit. Further, our results reveal that the noise amplitude also increases in proportion to the asymmetry factor. We establish that the commensurate increase of the noise amplitude originates from the intrinsic low-frequency characteristic of the sensor noise, dominated by number fluctuation. These findings suggest that this capacitive signal amplification scheme does not improve the intrinsic detection limit of the dual-gate biosensors.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanowire Synthesis and Applications · Analytical Chemistry and Sensors · Force Microscopy Techniques and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Electrical and Computer Engineering, New York University, Brooklyn, New York 10003, United States
Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
Funding
Brookhaven National Laboratory
References (27)
Show source-provided references
1. 10.1109/TBME.1970.450268810.1109/TBME.1970.4502688 ↗
2. 10.1038/nature1024210.1038/nature10242 ↗
3. 10.1038/nature0549810.1038/nature05498 ↗
4. 10.1021/nl070901710.1021/nl0709017 ↗
5. 10.1021/nl034061h10.1021/nl034061h ↗
6. 10.1021/nl080094r10.1021/nl080094r ↗
7. 10.1126/sciadv.160255710.1126/sciadv.1602557 ↗
8. 10.1126/science.291.5505.85110.1126/science.291.5505.851 ↗
9. 10.1038/nbt113810.1038/nbt1138 ↗
10. 10.1002/adfm.20090183010.1002/adfm.200901830 ↗
11. 10.1039/C5NR03146J10.1039/C5NR03146J ↗
12. 10.1021/nl100892y10.1021/nl100892y ↗
13. 10.1038/srep0528410.1038/srep05284 ↗
14. Huang, Y.J.; Lin, C.C.; Huang, J.C.; Hsieh, C.H.; Wen, C.H.; Chen, T.T.; Jeng, L.S.; Yang, C.K.; Yang, J.H.; Tsui, F.; Liu, Y.S.; Chen, M.High Performance Dual-Gate ISFET with Non-Ideal Effect Reduction Schemes in a SOI-CMOS Bioelectrical SoC. Proceedings from theIEEE International Electron Devices Meeting (IEDM), Washington, DC, December 7–9, 2015;IEEE:Piscataway, NJ, 2015; pp749–750.10.1109/IEDM.2015.7409792 ↗
15. 10.1063/1.353667410.1063/1.3536674 ↗
16. Cheng, K.; Khakifirooz, A.; Kulkarni, P.; Ponoth, S.; Kuss, J.; Shahrjerdi, D.; Edge, L.; Kimball, A.; Kanakasabapathy, S.; Xiu, K.; Schmitz, S.; Reznicek, A.; Adam, T.; He, H.; Loubet, N.; Holmes, S.; Mehta, S.; Yang, D.; Upham, A.; Seo, S.Extremely Thin SOI (ETSOI) CMOS with Record Low Variability for Low Power System-on-Chip Applications. Proceedings from theIEEE International Electron Devices Meeting (IEDM), December 15–17, 2009, Washington, DC, 2009; IEEE:Piscataway, NJ; pp1–4.10.1109/IEDM.2009.5424422 ↗
17. 10.1021/nl071792z10.1021/nl071792z ↗
18. 10.1109/TED.2004.83833810.1109/TED.2004.838338 ↗
19. 10.1063/1.473760410.1063/1.4737604 ↗
20. 10.1021/jp071420e10.1021/jp071420e ↗
21. 10.1021/nl903421910.1021/nl9034219 ↗
22. 10.1021/nl803163610.1021/nl8031636 ↗
23. 10.1063/1.360815510.1063/1.3608155 ↗
24. 10.1063/1.487137410.1063/1.4871374 ↗
25. 10.1109/LED.2010.204700010.1109/LED.2010.2047000 ↗
26. 10.1002/pssa.221124022510.1002/pssa.2211240225 ↗
27. 10.1109/16.3424210.1109/16.34242 ↗