journal article·2024-07-23

Continuous Template Growth of Large-Scale Tellurene Films on 1T′-MoTe2

Jin Young Park, Min Soo Moon, Heewoo Lee, Dongil Kim, Hajung Park, Jae Woo Kim, Hayoung Ko, Taewoo Ha, Jeongwoo Kim, Young-Mi Bahk, Byoung Hee Moon, Ki Kang Kim, Seung Ryong Park, Soobong Choi, Riya Sebait, Jung Ho Kim, Young Hee Lee, Gang Hee Han

ACS Nano· Volume 18· Issue 29
Publisher page

Abstract

Use of a template triggers an epitaxial interaction with the depositing material during synthesis. Recent studies have demonstrated that two-dimensional tellurium (tellurene) can be directionally oriented when grown on transition metal dichalcogenide (TMD) templates. Specifically, employing a T-phase TMD, such as WTe 2, restricts the growth direction even further due to its anisotropic nature, which allows for the synthesis of well-oriented tellurene films. Despite this, producing large-area epitaxial films still remains a significant challenge. Here, we report the continuous synthesis of a 1T′-MoTe 2 template via chemical vapor deposition and tellurene via vapor transport. The interaction between helical Te and the 1T′-MoTe 2 template facilitates the Te chains to collapse into ribbon shapes, enhancing lateral growth at a rate approximately 6 times higher than in the vertical direction, as confirmed by scanning electron microscopy and atomic force microscopy. Interestingly, despite the predominance of the lateral growth, cross-sectional transmission electron microscopy analysis of the tellurene ribbons revealed a consistent 60-degree incline at the edges. This suggests that the edges of the tellurene ribbons, where they contact the template surface, are favorable sites for additional Te absorption, which then stacks along the incline angle to expand. Furthermore, controlling the synthesis temperature, duration, and preheating time has facilitated the successful synthesis of tellurene films. The resultant tellurene exhibited hole mobility as high as ∼400 cm 2 /V s. After removing the underlying metallic template with plasma treatment, the film showed a current on/off ratio of ∼10 3 . This ratio was confirmed by two-terminal field-effect transistor measurements and supported by near-field terahertz (THz) spectroscopy mapping.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · Chalcogenide Semiconductor Thin Films · Quantum Dots Synthesis And Properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Physics, Incheon National University (INU), Incheon 22012, Korea

Center for Integrated Nanostructure Physics (CINAP), Institute for Basic Science (IBS), Suwon 16419, Korea

Sungkyunkwan University, Suwon 16419, Korea

Funding

National Research Foundation of Korea · Institute for Basic Science

References (43)

Show source-provided references
1. 10.1103/PhysRevLett.119.10610110.1103/PhysRevLett.119.106101 ↗
2. 10.1016/j.scib.2018.01.01010.1016/j.scib.2018.01.010 ↗
3. 10.1038/s41928-018-0058-410.1038/s41928-018-0058-4 ↗
4. 10.1103/PhysRevLett.110.17640110.1103/PhysRevLett.110.176401 ↗
5. 10.1103/PhysRevLett.114.20640110.1103/PhysRevLett.114.206401 ↗
6. 10.1103/PhysRevB.95.12520410.1103/PhysRevB.95.125204 ↗
7. 10.1103/PhysRevB.97.03515810.1103/PhysRevB.97.035158 ↗
8. 10.1103/PhysRevB.97.20520610.1103/PhysRevB.97.205206 ↗
9. 10.1038/s41565-020-0715-410.1038/s41565-020-0715-4 ↗
10. 10.1021/acs.nanolett.8b0514410.1021/acs.nanolett.8b05144 ↗
11. 10.1038/ncomms1028710.1038/ncomms10287 ↗
12. 10.1002/adma.20130065710.1002/adma.201300657 ↗
13. 10.1016/j.mattod.2020.10.03010.1016/j.mattod.2020.10.030 ↗
14. 10.1038/s41565-019-0585-910.1038/s41565-019-0585-9 ↗
15. 10.1002/aelm.20210133110.1002/aelm.202101331 ↗
16. 10.1016/j.apsusc.2016.09.15710.1016/j.apsusc.2016.09.157 ↗
17. 10.1103/PhysRevB.89.19520610.1103/PhysRevB.89.195206 ↗
18. 10.1021/acsnano.8b0342410.1021/acsnano.8b03424 ↗
19. 10.1002/adfm.20170583310.1002/adfm.201705833 ↗
20. 10.1021/acsphotonics.9b0069410.1021/acsphotonics.9b00694 ↗
21. 10.1021/acs.nanolett.9b0182710.1021/acs.nanolett.9b01827 ↗
22. 10.1039/D2NR02822K10.1039/D2NR02822K ↗
23. 10.1039/D1TC02936C10.1039/D1TC02936C ↗
24. 10.1038/s41467-020-16125-810.1038/s41467-020-16125-8 ↗
25. 10.1016/j.nanoen.2023.10855210.1016/j.nanoen.2023.108552 ↗
26. 10.1002/advs.20210387310.1002/advs.202103873 ↗
27. 10.1016/j.optlastec.2020.10681710.1016/j.optlastec.2020.106817 ↗
28. 10.1039/C8TC03286F10.1039/C8TC03286F ↗
29. 10.1016/j.mtphys.2023.10106910.1016/j.mtphys.2023.101069 ↗
30. 10.1002/adfm.20231113410.1002/adfm.202311134 ↗
31. 10.1016/j.nanoen.2018.12.06510.1016/j.nanoen.2018.12.065 ↗
32. 10.1021/acs.nanolett.7b0102910.1021/acs.nanolett.7b01029 ↗
33. 10.1002/adfm.20190658510.1002/adfm.201906585 ↗
34. 10.1021/nn502810410.1021/nn5028104 ↗
35. 10.1103/PhysRevMaterials.2.10400210.1103/PhysRevMaterials.2.104002 ↗
36. 10.1002/admi.20210154010.1002/admi.202101540 ↗
37. 10.1088/1361-6528/aa7e5e10.1088/1361-6528/aa7e5e ↗
38. 10.1088/2053-1583/3/3/03101010.1088/2053-1583/3/3/031010 ↗
39. 10.1021/acs.nanolett.6b0134210.1021/acs.nanolett.6b01342 ↗
40. 10.1038/s41467-020-17766-510.1038/s41467-020-17766-5 ↗
41. 10.1002/adma.20180310910.1002/adma.201803109 ↗
42. 10.1038/s41699-021-00280-710.1038/s41699-021-00280-7 ↗
43. 10.1016/j.isci.2021.10359410.1016/j.isci.2021.103594 ↗